Abstract

The characteristics of the surface relief hologram which is produced by a photoresist and its replica by an embossing method are experimentally studied. It becomes clear that the maximum diffraction efficiency of the photoresist hologram and that of the replica hologram are almost the same value—21–25%—and the maximum SNR of the original hologram and its replica are fairly good.

© 1974 Optical Society of America

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Corrections

Fujio Iwata and Jumpei Tsujiuchi, "Characteristics of a Photoresist Hologram and Its Replica: Errata," Appl. Opt. 13, 2190-2190 (1974)
https://www.osapublishing.org/ao/abstract.cfm?uri=ao-13-10-2190

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