Abstract

Recording of relief phase holograms in Shipley AZ-1350 positive photoresist is investigated in this report. It is found that the use of Shipley AZ-303 developer with Shipley AZ-1350 photoresist relieves the material nonlinearity usually associated with photoresists, thereby allowing higher image readout efficiencies. The use of Shipley AZ-303 developer also provides an increase in material sensitivity. A theoretical model for positive photoresist exposure characteristics is developed and verified by empirical results. Using Shipley AZ-303 developer, a design procedure for recording useful (i.e., acceptable SNR > 25 dB, high efficiency ~3–5%, exposure sensitivity ~ a few mJ·cm−2) relief phase holograms in Shipley AZ-1350 positive photoresist is synthesized.

© 1974 Optical Society of America

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