Abstract

The thicknesses of UO2 films from 100 Å to 1800 Å on uranium substrates were determined from reflectance measurements in the visible region. The reflectance measurements on the U–UO2 system were analyzed by two different methods to determine film thicknesses. In the first method, film thicknesses were determined by comparing theoretical reflectance calculations with the experimental reflectance measurements. In the second method, film thicknesses were determined by obtaining the best match of the colorimetric properties (wavelength, excitation purity, and luminous reflectance) of the sample with the colorimetric properties of a predetermined film thickness calibration curve.

© 1973 Optical Society of America

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References

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  1. O. S. Heavens, Optical Properties of Thin Solid Films (Dover, New York, 1965).
  2. E. P. Lavin, Specular Reflection (American Elsevier, New York, 1971).
  3. U. R. Evans, The Corrosion and Oxidation of Metals (Edward Arnold, London1961), pp. 20, 54, 85, and 787.
  4. See for example, OSA Committee on Colorimetry, The Science of Color (Washington, D.C., 1963), Chaps. 7 and 8.
  5. OSA Committee on Colorimetry, The Science of Color, (Washington, D.C., 1963), p. 270.
  6. L. A. Lott, D. L. Cash, Appl. Opt. 12, 837 (1973).
    [CrossRef] [PubMed]
  7. F. L. McCrackin, J. P. Colson in Ellipsometry in the Measurement of Surfaces and Thin Films, E. Passaglia, R. R. Stromberg, J. Kruger, Eds., NBS Misc. Publ. 256 (U.S. Govt. Printing Office, Washington, D.C., 1964), p. 61.
  8. D. T. Larson, J. Vac. Sci. Technol. 8, 80 (1971).
    [CrossRef]
  9. P. Camagni, A. Manara, E. Landais, Surface Sci. 10, 332 (1968)
    [CrossRef]

1973 (1)

1971 (1)

D. T. Larson, J. Vac. Sci. Technol. 8, 80 (1971).
[CrossRef]

1968 (1)

P. Camagni, A. Manara, E. Landais, Surface Sci. 10, 332 (1968)
[CrossRef]

Camagni, P.

P. Camagni, A. Manara, E. Landais, Surface Sci. 10, 332 (1968)
[CrossRef]

Cash, D. L.

Colson, J. P.

F. L. McCrackin, J. P. Colson in Ellipsometry in the Measurement of Surfaces and Thin Films, E. Passaglia, R. R. Stromberg, J. Kruger, Eds., NBS Misc. Publ. 256 (U.S. Govt. Printing Office, Washington, D.C., 1964), p. 61.

Evans, U. R.

U. R. Evans, The Corrosion and Oxidation of Metals (Edward Arnold, London1961), pp. 20, 54, 85, and 787.

Heavens, O. S.

O. S. Heavens, Optical Properties of Thin Solid Films (Dover, New York, 1965).

Landais, E.

P. Camagni, A. Manara, E. Landais, Surface Sci. 10, 332 (1968)
[CrossRef]

Larson, D. T.

D. T. Larson, J. Vac. Sci. Technol. 8, 80 (1971).
[CrossRef]

Lavin, E. P.

E. P. Lavin, Specular Reflection (American Elsevier, New York, 1971).

Lott, L. A.

Manara, A.

P. Camagni, A. Manara, E. Landais, Surface Sci. 10, 332 (1968)
[CrossRef]

McCrackin, F. L.

F. L. McCrackin, J. P. Colson in Ellipsometry in the Measurement of Surfaces and Thin Films, E. Passaglia, R. R. Stromberg, J. Kruger, Eds., NBS Misc. Publ. 256 (U.S. Govt. Printing Office, Washington, D.C., 1964), p. 61.

Appl. Opt. (1)

J. Vac. Sci. Technol. (1)

D. T. Larson, J. Vac. Sci. Technol. 8, 80 (1971).
[CrossRef]

Surface Sci. (1)

P. Camagni, A. Manara, E. Landais, Surface Sci. 10, 332 (1968)
[CrossRef]

Other (6)

F. L. McCrackin, J. P. Colson in Ellipsometry in the Measurement of Surfaces and Thin Films, E. Passaglia, R. R. Stromberg, J. Kruger, Eds., NBS Misc. Publ. 256 (U.S. Govt. Printing Office, Washington, D.C., 1964), p. 61.

O. S. Heavens, Optical Properties of Thin Solid Films (Dover, New York, 1965).

E. P. Lavin, Specular Reflection (American Elsevier, New York, 1971).

U. R. Evans, The Corrosion and Oxidation of Metals (Edward Arnold, London1961), pp. 20, 54, 85, and 787.

See for example, OSA Committee on Colorimetry, The Science of Color (Washington, D.C., 1963), Chaps. 7 and 8.

OSA Committee on Colorimetry, The Science of Color, (Washington, D.C., 1963), p. 270.

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Figures (4)

Fig. 1
Fig. 1

Film thickness determined by comparison of experimental reflectance with theoretical reflectance calculations vs ellipsometric thickness.

Fig. 2
Fig. 2

Wavelength, excitation purity, and luminous reflectance as a function of ellipsometric thickness for U–UO2 system. The wavelengths are represented by four regions. Region indicated by 1: dominant wavelengths 610–780 mμ; complementary wavelengths 493c–567c mμ and dominant wavelengths 380–450 mμ. Region indicated by 2 is for dominant wavelengths from 500 mμ to 570 mμ.

Fig. 3
Fig. 3

Film thickness determined by color analysis method vs ellipsometric thickness.

Fig. 4
Fig. 4

Reflectance spectra for UO2 films on uranium substrates.

Equations (5)

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r ^ = r exp ( i δ ) = [ r ^ 12 + r ^ 23 exp ( - β i ) ] / [ 1 + r ^ 12 r ^ 23 exp ( - β i ) ] ,
r ^ 12 = ( n ^ 2 - n 1 ) / ( n ^ 2 + n 1 ) and r ^ 23 = ( n ^ 3 - n ^ 2 ) / ( n ^ 3 + n ^ 2 ) .
λ ( R λ exp - R λ , d calc , ) 2
X = 0 x ¯ λ P λ ρ λ d λ / 0 y ¯ λ P λ d λ , Y = 0 y ¯ λ P λ ρ λ d λ / 0 y ¯ λ P λ d λ , Z = 0 z ¯ λ P λ ρ λ d λ / 0 y ¯ λ P λ d λ .
E = ( Y exp - Y d cal ) 2 + ( P exp - P d cal ) 2

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