Abstract

Thin film integrated optics components such as light guides, modulators, directional couplers, and polarizers demand high quality edge smoothness and high resolution pattern formation in dimensions down to submicrometer size. Fabrication techniques combining holographic and scanning electron beam lithography with ion beam micromachining have produced planar phase gratings with intervals as small as 2800 Å, guiding channel couplers in GaAs, and also wire- grid polarizers for 10.6-μm radiation.

© 1973 Optical Society of America

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