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  1. J. Nakajima, T. Inagaki, Y. Nishimura, Fujit. Sci. Tech. J.69 (Sept.1970).
  2. N. K. Sheridon, Appl. Phys. Lett. 12, 316 (1968).
    [CrossRef]
  3. M. T. Gale, D. L. Greenaway, J. P. Russell, “Applications of Holography,” in Proceedings of the International Symposium of Holography, Besancon, 6–11 July1970, Laboratorie de Physique Generale et Optique (Universite de Besancon, LaBouloie 25, Besancon, France), p. 1–11.
  4. R. Bartolini, W. Hannan, D. Karlsons, M. Lurie, Appl. Opt. 9, 2283 (1970).
    [CrossRef] [PubMed]
  5. M. J. Bessley, J. G. Castledine, Appl. Opt. 9, 2720 (1970).
    [CrossRef]
  6. R. K. Agnihotri, F. P. Hood, L. G. Lesoine, J. A. Offenbach, Photogr. Sci. Eng. 15, 141 (1971).
  7. The polyvinyl cinnamate photoresist used here is the commercially available Kodak Ortho Resist (Eastman Kodak Co.).
  8. H. D. Keith, F. J. Padden, R. G. Vadimsky, J. Appl. Phys. 42, 4584 (1971).
    [CrossRef]

1971 (2)

R. K. Agnihotri, F. P. Hood, L. G. Lesoine, J. A. Offenbach, Photogr. Sci. Eng. 15, 141 (1971).

H. D. Keith, F. J. Padden, R. G. Vadimsky, J. Appl. Phys. 42, 4584 (1971).
[CrossRef]

1970 (3)

1968 (1)

N. K. Sheridon, Appl. Phys. Lett. 12, 316 (1968).
[CrossRef]

Agnihotri, R. K.

R. K. Agnihotri, F. P. Hood, L. G. Lesoine, J. A. Offenbach, Photogr. Sci. Eng. 15, 141 (1971).

Bartolini, R.

Bessley, M. J.

Castledine, J. G.

Gale, M. T.

M. T. Gale, D. L. Greenaway, J. P. Russell, “Applications of Holography,” in Proceedings of the International Symposium of Holography, Besancon, 6–11 July1970, Laboratorie de Physique Generale et Optique (Universite de Besancon, LaBouloie 25, Besancon, France), p. 1–11.

Greenaway, D. L.

M. T. Gale, D. L. Greenaway, J. P. Russell, “Applications of Holography,” in Proceedings of the International Symposium of Holography, Besancon, 6–11 July1970, Laboratorie de Physique Generale et Optique (Universite de Besancon, LaBouloie 25, Besancon, France), p. 1–11.

Hannan, W.

Hood, F. P.

R. K. Agnihotri, F. P. Hood, L. G. Lesoine, J. A. Offenbach, Photogr. Sci. Eng. 15, 141 (1971).

Inagaki, T.

J. Nakajima, T. Inagaki, Y. Nishimura, Fujit. Sci. Tech. J.69 (Sept.1970).

Karlsons, D.

Keith, H. D.

H. D. Keith, F. J. Padden, R. G. Vadimsky, J. Appl. Phys. 42, 4584 (1971).
[CrossRef]

Lesoine, L. G.

R. K. Agnihotri, F. P. Hood, L. G. Lesoine, J. A. Offenbach, Photogr. Sci. Eng. 15, 141 (1971).

Lurie, M.

Nakajima, J.

J. Nakajima, T. Inagaki, Y. Nishimura, Fujit. Sci. Tech. J.69 (Sept.1970).

Nishimura, Y.

J. Nakajima, T. Inagaki, Y. Nishimura, Fujit. Sci. Tech. J.69 (Sept.1970).

Offenbach, J. A.

R. K. Agnihotri, F. P. Hood, L. G. Lesoine, J. A. Offenbach, Photogr. Sci. Eng. 15, 141 (1971).

Padden, F. J.

H. D. Keith, F. J. Padden, R. G. Vadimsky, J. Appl. Phys. 42, 4584 (1971).
[CrossRef]

Russell, J. P.

M. T. Gale, D. L. Greenaway, J. P. Russell, “Applications of Holography,” in Proceedings of the International Symposium of Holography, Besancon, 6–11 July1970, Laboratorie de Physique Generale et Optique (Universite de Besancon, LaBouloie 25, Besancon, France), p. 1–11.

Sheridon, N. K.

N. K. Sheridon, Appl. Phys. Lett. 12, 316 (1968).
[CrossRef]

Vadimsky, R. G.

H. D. Keith, F. J. Padden, R. G. Vadimsky, J. Appl. Phys. 42, 4584 (1971).
[CrossRef]

Appl. Opt. (2)

Appl. Phys. Lett. (1)

N. K. Sheridon, Appl. Phys. Lett. 12, 316 (1968).
[CrossRef]

Fujit. Sci. Tech. J. (1)

J. Nakajima, T. Inagaki, Y. Nishimura, Fujit. Sci. Tech. J.69 (Sept.1970).

J. Appl. Phys. (1)

H. D. Keith, F. J. Padden, R. G. Vadimsky, J. Appl. Phys. 42, 4584 (1971).
[CrossRef]

Photogr. Sci. Eng. (1)

R. K. Agnihotri, F. P. Hood, L. G. Lesoine, J. A. Offenbach, Photogr. Sci. Eng. 15, 141 (1971).

Other (2)

The polyvinyl cinnamate photoresist used here is the commercially available Kodak Ortho Resist (Eastman Kodak Co.).

M. T. Gale, D. L. Greenaway, J. P. Russell, “Applications of Holography,” in Proceedings of the International Symposium of Holography, Besancon, 6–11 July1970, Laboratorie de Physique Generale et Optique (Universite de Besancon, LaBouloie 25, Besancon, France), p. 1–11.

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Figures (1)

Fig. 1
Fig. 1

Scanning electron micrograph of a 1000-cycle/mm grating formed in Kodak Ortho Resist by a 3511-Å wavelength two-beam interference. The resist was developed in Kodak Ortho Resist developer and rinsed in methanol.

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