Abstract

A four-parameter model is presented that describes the relief height response of negative working photo-resists. It is shown that the resist thickness after development is directly proportional to the logarithm of the exposure over a wide range of exposures. A relationship between this thickness and exposure is derived and shown to predict resist response. Resists can usefully record exposures that vary by a factor of 10 million making them ideal materials for recording wide dynamic ranges. Several applications using these unique properties are presented.

© 1972 Optical Society of America

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