Abstract

It has been found that vacuum-deposited films of CsI, AgCl, TlBr, and TlCl are useful as antireflection coatings for silicon over a broad spectral range in the infrared. Measurements performed on a plane-parallel silicon plate coated with various thicknesses of the above materials yield transmittance values ranging from 99% at λ = 2.9 μm to 88% at λ = 27 μm. Experimental details of the coating process and properties of the coatings are discussed.

© 1971 Optical Society of America

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References

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  1. P. D. Coleman, W. Q. Jeffers, C. J. Johnson, C. F. Wittig, D. L. Keune, “Device Aspects of a Far-Infrared Water Vapor Laser,” IEEE International Electron Devices Meeting, Washington, D.C., October 1967.
  2. R. A. McFarlane, L. H. Fretz, Appl. Phys. Lett. 14, 385 (1969).
    [CrossRef]
  3. K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), pp. 770–772.
  4. C. D. Salzburg, J. J. Villa, J. Opt. Soc. Am. 47, 244 (1957).
    [CrossRef]
  5. The Sloan Notebook—Suggestions for Thin Film Deposition (Sloan Technology Corporation, Santa Barbara, California).
  6. Handbook of Chemistry and Physics (Chemical Rubber Publishing Co., Cleveland, 1961), 43rd ed.
  7. D. E. McCarthy, Appl. Opt. 2, 591 (1963).
    [CrossRef]
  8. D. E. McCarthy, Appl. Opt. 4, 317 (1965).
    [CrossRef]
  9. W. S. Rodney, J. Opt. Soc. Am. 45, 987 (1955).
    [CrossRef]
  10. L. W. Tilton, E. K. Plyler, R. E. Stephens, J. Opt. Soc. Am. 40, 540 (1950).
    [CrossRef]
  11. D. E. McCarthy, Appl. Opt. 4, 878 (1965).
    [CrossRef]

1969 (1)

R. A. McFarlane, L. H. Fretz, Appl. Phys. Lett. 14, 385 (1969).
[CrossRef]

1965 (2)

1963 (1)

1957 (1)

1955 (1)

1950 (1)

Chopra, K. L.

K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), pp. 770–772.

Coleman, P. D.

P. D. Coleman, W. Q. Jeffers, C. J. Johnson, C. F. Wittig, D. L. Keune, “Device Aspects of a Far-Infrared Water Vapor Laser,” IEEE International Electron Devices Meeting, Washington, D.C., October 1967.

Fretz, L. H.

R. A. McFarlane, L. H. Fretz, Appl. Phys. Lett. 14, 385 (1969).
[CrossRef]

Jeffers, W. Q.

P. D. Coleman, W. Q. Jeffers, C. J. Johnson, C. F. Wittig, D. L. Keune, “Device Aspects of a Far-Infrared Water Vapor Laser,” IEEE International Electron Devices Meeting, Washington, D.C., October 1967.

Johnson, C. J.

P. D. Coleman, W. Q. Jeffers, C. J. Johnson, C. F. Wittig, D. L. Keune, “Device Aspects of a Far-Infrared Water Vapor Laser,” IEEE International Electron Devices Meeting, Washington, D.C., October 1967.

Keune, D. L.

P. D. Coleman, W. Q. Jeffers, C. J. Johnson, C. F. Wittig, D. L. Keune, “Device Aspects of a Far-Infrared Water Vapor Laser,” IEEE International Electron Devices Meeting, Washington, D.C., October 1967.

McCarthy, D. E.

McFarlane, R. A.

R. A. McFarlane, L. H. Fretz, Appl. Phys. Lett. 14, 385 (1969).
[CrossRef]

Plyler, E. K.

Rodney, W. S.

Salzburg, C. D.

Stephens, R. E.

Tilton, L. W.

Villa, J. J.

Wittig, C. F.

P. D. Coleman, W. Q. Jeffers, C. J. Johnson, C. F. Wittig, D. L. Keune, “Device Aspects of a Far-Infrared Water Vapor Laser,” IEEE International Electron Devices Meeting, Washington, D.C., October 1967.

Appl. Opt. (3)

Appl. Phys. Lett. (1)

R. A. McFarlane, L. H. Fretz, Appl. Phys. Lett. 14, 385 (1969).
[CrossRef]

J. Opt. Soc. Am. (3)

Other (4)

K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), pp. 770–772.

The Sloan Notebook—Suggestions for Thin Film Deposition (Sloan Technology Corporation, Santa Barbara, California).

Handbook of Chemistry and Physics (Chemical Rubber Publishing Co., Cleveland, 1961), 43rd ed.

P. D. Coleman, W. Q. Jeffers, C. J. Johnson, C. F. Wittig, D. L. Keune, “Device Aspects of a Far-Infrared Water Vapor Laser,” IEEE International Electron Devices Meeting, Washington, D.C., October 1967.

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