Nano-finishing of the monocrystalline silicon wafer using magnetic abrasive finishing process

Mohammad Mosavat; Abdolreza Rahimi; Mohammad Javad Eshraghi; Saeideh Karami

doi:10.1364/AO.58.003447

Applied Optics
Vol. 58,
Issue 13,
pp. 3447-3453
(2019)
•https://doi.org/10.1364/AO.58.003447

Nano-finishing of the monocrystalline silicon wafer using magnetic abrasive finishing process

Mohammad Mosavat, Abdolreza Rahimi, Mohammad Javad Eshraghi, and Saeideh Karami

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
Mohammad Mosavat, Abdolreza Rahimi, Mohammad Javad Eshraghi, and Saeideh Karami, "Nano-finishing of the monocrystalline silicon wafer using magnetic abrasive finishing process," Appl. Opt. 58, 3447-3453 (2019)

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Check for updates

Abstract

The monocrystalline silicon wafer is the key material for micro-electro–mechanical systems. The performance of these wafers depends on their surface and subsurface quality. This research aims to study the effect of process parameters on the reduction ratio rate in surface roughness ( $% Δ \dot{R}$ ) of monocrystalline silicon wafers during the magnetic abrasive finishing process using response surface methodology. The parameters studied are machining gap, rotational speed, abrasive size, and magnetic abrasive particle (MAP) size. Quadratic models are developed by applying Box–Behnken design. Also, experiments are carried out on the silicon wafer, and the results of surface roughness data are analyzed by using analysis of variance. The most significant factor on each experimental design response is identified. According to our findings, the maximum $% Δ \dot{R}$ value and the best surface roughness of the silicon wafer achieve 3.70 and 31 nm, respectively. Furthermore, the material removal mechanism in wafers is investigated by using atomic force microscopy. Our observations show that both micro-fracture and micro-cutting mechanisms might happen, and it highly depends on polishing parameters.

Full Article | PDF Article

More Like This

Nano-finishing of BK7 optical glass using magnetic abrasive finishing process

Farzad Pashmforoush and Abdolreza Rahimi
Appl. Opt. 54(9) 2199-2207 (2015)

Numerical-experimental study on the polishing of silicon wafers using coupled finite element-smoothed particle hydrodynamics

Mohammad Mosavat and Abdolreza Rahimi
Appl. Opt. 58(6) 1569-1576 (2019)

Mathematical modeling of surface roughness in magnetic abrasive finishing of BK7 optical glass

Farzad Pashmforoush, Abdolreza Rahimi, and Mehdi Kazemi
Appl. Opt. 54(28) 8275-8281 (2015)

Previous Article Next Article

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (8)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (5)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (3)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Parameters	Levels
Parameters	Low	Medium	High
Machining gap (mm)	1	1.5	2
Rotational speed (rpm)	800	1025	1250
MAP size (μm)	25	50	75
Abrasive size (μm)	1	3	5

Std	Machining Gap (mm)	Rotational Speed (rpm)	Abrasive Size (μm)	MAP Size (μm)	Initial Surface Roughness (nm)	Final Surface Roughness (nm)	$% Δ \dot{R}$ $(\min^{- 1})$
1	1	800	3	50	238	147	1.92
2	2	800	3	50	232	176	1.21
3	1	1250	3	50	255	113	2.79
4	2	1250	3	50	254	161	1.83
5	1.5	1025	1	25	247	88	3.22
6	1.5	1025	5	25	239	152	1.82
7	1.5	1025	1	75	221	131	2.04
8	1.5	1025	5	75	189	137	1.37
9	1	1025	3	25	181	103	2.17
10	2	1025	3	25	161	119	1.30
11	1	1025	3	75	205	153	1.26
12	2	1025	3	75	187	166	0.55
13	1.5	800	1	50	268	139	2.40
14	1.5	1250	1	50	259	73	3.59
15	1.5	800	5	50	314	163	2.40
16	1.5	1250	5	50	238	112	2.64
17	1	1025	1	50	243	141	2.10
18	2	1025	1	50	230	156	1.62
19	1	1025	5	50	210	147	1.51
20	2	1025	5	50	162	152	0.31
21	1.5	800	3	25	216	119	2.24
22	1.5	1250	3	25	201	72	3.21
23	1.5	800	3	75	177	117	1.70
24	1.5	1250	3	75	175	93	2.35
25	1.5	1025	3	50	399	110	3.62
26	1.5	1025	3	50	114	31	3.64
27	1.5	1025	3	50	377	98	3.70

Source	Sum of Squares	DF	Mean Square	$F$ - Value	$P$ - Value	Remarks
Linear	14.47	20	0.72	417.35	0.0024
2FI	13.93	14	1.00	574.13	0.0017
Quadratic	0.32	10	0.032	18.59	0.0521	Suggested
Cubic	0.12	2	0.062	35.70	0.0272	Aliased
Pure error	3.467E-003	2	1.733E-003

Source	DF	$F$ -Value	$P$ -Value
Model	14	57.20	0.000
A, Machining gap	1	74.61	0.000
B, Rotational speed	1	63.28	0.000
C, Abrasive size	1	74.31	0.000
D, MAP size	1	67.53	0.000
$A^{2}$	1	434.24	0.000
$B^{2}$	1	14.63	0.002
$C^{2}$	1	90.96	0.000
$D^{2}$	1	160.62	0.000
AB	1	0.58	0.463
AC	1	4.77	0.049
AD	1	0.24	0.636
BC	1	8.31	0.014
BD	1	0.94	0.351
CD	1	4.91	0.047
R-sq: 98.52%, R-sq (adj): 96.80%, R-sq (pred): 91.55%.

Source	DF	$F$ -Value	$P$ -Value
Model	11	79.22	0.000
A, Machining gap	1	81.37	0.000
B, Rotational speed	1	69.01	0.000
C, Abrasive size	1	81.04	0.000
D, MAP size	1	73.64	0.000
$A^{2}$	1	473.57	0.000
$B^{2}$	1	15.96	0.001
$C^{2}$	1	99.20	0.000
$D^{2}$	1	176.17	0.000
AC	1	5.21	0.038
BC	1	9.06	0.009
CD	1	5.35	0.035
R-sq: 98.31%, R-sq (adj): 97.07%, R-sq (pred): 92.26%.

Abstract

Cited By

Figures (8)

Tables (5)

Equations (3)

Applied Optics