Abstract

In order to improve the efficiency uniformity of large-aperture beam sampling gratings (BSGs), a conventional chemical mechanical polishing (CMP) process of fused silica by CeO2 slurry is proposed to modify their groove profiles. With the proposed CMP process, the efficiency uniformity of several BSGs with an aperture of 430  mm×430  mm has been successfully controlled within an rms of 5%. The proposed CMP process is an effective method to improve the efficiency uniformity of large-aperture BSGs. Using the proposed CMP process, the requirement of the uniformity of the holographic ion beam etching process can be released in the realization of large-aperture BSGs.

© 2014 Optical Society of America

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