Abstract

The irradiance in microscopic lithography using a digital micro-mirror device (DMD) as a virtual digital mask generator is influenced by diffraction effects that have been exploited to fabricate microstructures. Based on the established model, the theoretical analysis and simulation of DMD diffraction characteristics has been studied. A novel method without masking to fabricate a micro-lens by pixilation of micro-mirrors inside the DMDs used in microscopic lithography has been proposed. It is a method of precise control of photon-induced curing behavior of photoresist by full use of diffraction effects and verification of the feasibility of the fabrication method based on diffraction. The introduced method provides an option for accurate and flexible micro-fabrication of microstructures.

© 2014 Optical Society of America

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