Design, production, and reverse engineering of two-octave antireflection coatings

Tatiana V. Amotchkina; Michael K. Trubetskov; Vladimir Pervak; Alexander V. Tikhonravov

doi:10.1364/AO.50.006468

Design, production, and reverse engineering of two-octave antireflection coatings

Tatiana V. Amotchkina, Michael K. Trubetskov, Vladimir Pervak, and Alexander V. Tikhonravov

Applied Optics
Vol. 50,
Issue 35,
pp. 6468-6475
(2011)
•https://doi.org/10.1364/AO.50.006468

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Tatiana V. Amotchkina, Michael K. Trubetskov, Vladimir Pervak, and Alexander V. Tikhonravov, "Design, production, and reverse engineering of two-octave antireflection coatings," Appl. Opt. 50, 6468-6475 (2011)

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Related Topics
Table of Contents Category
- Thin Films
Previously assigned OCIS codes
- Antireflection coatings (310.1210)
- Deposition and fabrication (310.1860)
- Multilayer design (310.4165)
- Refinement and synthesis methods (310.5696)
- Theory and design (310.6805)

About this Article
History
- Original Manuscript: July 22, 2011
- Revised Manuscript: August 31, 2011
- Manuscript Accepted: August 31, 2011
- Published: December 2, 2011

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Abstract

We deal with design and production of optimal two-component antireflection (AR) coatings for an ultra broadband spectral range from $450 nm$ to $1800 nm$ . We demonstrate the whole design-production chain including design selection, choosing monitoring technique, coating production, and reverse engineering of the deposited coatings. At each step of this chain we provide thorough analysis on the basis of theoretical results and adequate computational manufacturing experiments. In order to produce the designed AR coatings we use magnetron sputtering deposition technique and accurate time monitoring.

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Material	$A_{0}$	$A_{1}$	$A_{2}$
${Ta}_{2} O_{5}$	2.065721	0.01683	0.001686
${Nb}_{2} O_{5}$	2.218485	0.021827	$3.99968 \cdot 10^{- 3}$
${SiO}_{2}$	1.460472	0	$4.9867 \cdot 10^{- 4}$
Glass	1.500859	$3.26477 \cdot 10^{- 3}$	$5.0404 \cdot 10^{- 4}$

Materials: ${Ta}_{2} O_{5}$ and ${SiO}_{2}$				Materials: ${Nb}_{2} O_{5}$ and ${SiO}_{2}$
Design Name	m	TOT, nm	$R_{av}$ , %	Design Name	m	TOT, nm	$R_{av}$ , %
AR-Ta-1	10	1133	1.60	AR-Nb-1	12	1100	1.44
AR-Ta-2	20	2185	1.44	AR-Nb-2	22	2283	1.24
AR-Ta-3	30	3369	1.35	AR-Nb-3	30	3368	1.19

Materials: ${Ta}_{2} O_{5}$ and ${SiO}_{2}$			Materials: ${Nb}_{2} O_{5}$ and ${SiO}_{2}$
Design Name	Level of Errors, nm	$E (Δ R_{av})$	Design Name	Level of Errors, nm	$E (Δ R_{av})$
AR-Ta-1	0.5	0.12	AR-Nb-1	0.5	0.19
	1.0	0.26		1.0	0.35
	2.0	0.54		2.0	0.80
AR-Ta-2	0.5	0.23	AR-Nb-2	0.5	0.30
	1.0	0.39		1.0	0.56
	2.0	0.82		2.0	1.29
AR-Ta-3	0.5	0.32	AR-Nb-3	0.5	0.31
	1.0	0.58		1.0	0.59
	2.0	1.35		2.0	1.40

	AR-Ta-1		AR-Nb-1
Layer number	Thicknesses, nm	Material	Thicknesses, nm	Material
1	5.31	${Ta}_{2} O_{5}$	7.93	${Nb}_{2} O_{5}$
2	91.56	${SiO}_{2}$	79.88	${SiO}_{2}$
3	21.41	${Ta}_{2} O_{5}$	24.47	${Nb}_{2} O_{5}$
4	57.21	${SiO}_{2}$	47.95	${SiO}_{2}$
5	45.10	${Ta}_{2} O_{5}$	45.92	${Nb}_{2} O_{5}$
6	23.08	${SiO}_{2}$	17.49	${SiO}_{2}$
7	200.93	${Ta}_{2} O_{5}$	115.07	${Nb}_{2} O_{5}$
8	30.93	${SiO}_{2}$	7.00	${SiO}_{2}$
9	32.21	${Ta}_{2} O_{5}$	56.64	${Nb}_{2} O_{5}$
10	136.32	${SiO}_{2}$	36.47	${SiO}_{2}$
11			27.15	${Nb}_{2} O_{5}$
12			138.21	${SiO}_{2}$

Range Target $T_{AR}$ , %	Y(BBM), %	Level of Errors in Layer Thicknesses, nm	Y(TM), %
93	75	0.5	100
		1.0	99
		1.5	94
		2.0	81
93.5	60	0.5	100
		1.0	98
		1.5	83
		2.0	63
94	20	0.5	100
		1.0	89
		1.5	62
		2.0	34

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