Abstract

We report the design and experimental testing of a high-spatial-resolution nulling microellipsometer. This microellipsometer design is based on the previously reported principle of rotational polarization symmetry to improve the signal-to-noise ratio of spatially resolved ellipsometric measurements. Through the use of an electro-optic polarization rotator, a null detection scheme is made possible and implemented. Surface profiling of a lithographically patterned microstructure is demonstrated with the nulling microellipsometer. A lateral spatial resolution of 0.48 μm is calculated with a numerical aperture of 0.9 and an illumination wavelength of 632.8 nm.

© 2010 Optical Society of America

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2009

2008

2007

2006

2005

F. Linke and R. Merkle, “Quantitative ellipsometry microscopy at the silicon-air interface,” Rev. Sci. Instrum. 76, 063701 (2005).
[CrossRef]

2002

Q. Zhan and J. R. Leger, “Interferometric measurement of Berry's phase in space-variant polarization manipulations,” Opt. Commun. 213, 241-245 (2002).
[CrossRef]

Q. Zhan and J. R. Leger, “Microellipsometer with radial symmetry,” Appl. Opt. 41, 4630-4637 (2002).
[CrossRef]

1999

T. E. Jenkins, “Multiple-angle-of-incidence ellipsometry,” J. Phys. D 32, R45-R56 (1999).
[CrossRef]

1998

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, “Characterization of titanium nitride (TiN) films on various substrate using spectrophotometry, beam profile reflectometry, beam profile ellipsometry, and spectroscopic beam profile ellipsometry,” Thin Solid Films 313-314, 308-313 (1998).
[CrossRef]

1996

1994

1986

M. Erman and J. B. Theeten, “Spatially resolved ellipsometry,” J. Appl. Phys. 60, 859-873 (1986).
[CrossRef]

Amra, C.

Arnaud, L.

Arwin, H.

Azzam, R. M. A.

R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, 1977).

Bashara, N. M.

R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, 1977).

Chazallet, F.

Chegal, W.

S. Ye, Y. K. Kwak, S. H. Cho, Y. J. Cho, and W. Chegal, “Development of a focused-beam ellipsometer based on a new principle,” in Frontiers of Characterization and Metrology for Nanoelectronics, D. G. Seiler, A. C. Diebold, R. McDonald, C. M. Gamer, D. Herr, R. P. Khosla, and E. M. Secula, ed. (American Institute of Physics, 2007), pp. 69-73.

Chen, J.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, “Characterization of titanium nitride (TiN) films on various substrate using spectrophotometry, beam profile reflectometry, beam profile ellipsometry, and spectroscopic beam profile ellipsometry,” Thin Solid Films 313-314, 308-313 (1998).
[CrossRef]

Chen, K.

Chen, L.

Cho, S. H.

S. Ye, Y. K. Kwak, S. H. Cho, Y. J. Cho, and W. Chegal, “Development of a focused-beam ellipsometer based on a new principle,” in Frontiers of Characterization and Metrology for Nanoelectronics, D. G. Seiler, A. C. Diebold, R. McDonald, C. M. Gamer, D. Herr, R. P. Khosla, and E. M. Secula, ed. (American Institute of Physics, 2007), pp. 69-73.

Cho, Y. J.

S. Ye, Y. K. Kwak, S. H. Cho, Y. J. Cho, and W. Chegal, “Development of a focused-beam ellipsometer based on a new principle,” in Frontiers of Characterization and Metrology for Nanoelectronics, D. G. Seiler, A. C. Diebold, R. McDonald, C. M. Gamer, D. Herr, R. P. Khosla, and E. M. Secula, ed. (American Institute of Physics, 2007), pp. 69-73.

Deumié, C.

Erman, M.

M. Erman and J. B. Theeten, “Spatially resolved ellipsometry,” J. Appl. Phys. 60, 859-873 (1986).
[CrossRef]

Fanton, J.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, “Characterization of titanium nitride (TiN) films on various substrate using spectrophotometry, beam profile reflectometry, beam profile ellipsometry, and spectroscopic beam profile ellipsometry,” Thin Solid Films 313-314, 308-313 (1998).
[CrossRef]

Flannery, B. P.

W. H. Press, B. P. Flannery, S. A. Teukolsky, and W. T. Vetterling, “Modeling of data,” in Numerical Recipes in C: The Art of Scientific Computing (Cambridge U. Press, 1988), pp. 517-564.

Georges, G.

Holmes, R. D.

Huang, Y.

Humlicek, J.

J. Humlicek, “Polarized light and ellipsometry,” in Handbook of Ellipsometry, T. Harland and E. A. Irene, eds. (Springer, 2005), pp. 3-90.

Ishikawa, M.

Järrendahl, K.

Jenkins, T. E.

T. E. Jenkins, “Multiple-angle-of-incidence ellipsometry,” J. Phys. D 32, R45-R56 (1999).
[CrossRef]

Kozlovskaya, V.

Kwak, Y. K.

S. Ye, Y. K. Kwak, S. H. Cho, Y. J. Cho, and W. Chegal, “Development of a focused-beam ellipsometer based on a new principle,” in Frontiers of Characterization and Metrology for Nanoelectronics, D. G. Seiler, A. C. Diebold, R. McDonald, C. M. Gamer, D. Herr, R. P. Khosla, and E. M. Secula, ed. (American Institute of Physics, 2007), pp. 69-73.

Le Neindre, N.

Leger, J. R.

Q. Zhan and J. R. Leger, “Interferometric measurement of Berry's phase in space-variant polarization manipulations,” Opt. Commun. 213, 241-245 (2002).
[CrossRef]

Q. Zhan and J. R. Leger, “Microellipsometer with radial symmetry,” Appl. Opt. 41, 4630-4637 (2002).
[CrossRef]

Leng, J. M.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, “Characterization of titanium nitride (TiN) films on various substrate using spectrophotometry, beam profile reflectometry, beam profile ellipsometry, and spectroscopic beam profile ellipsometry,” Thin Solid Films 313-314, 308-313 (1998).
[CrossRef]

Linke, F.

F. Linke and R. Merkle, “Quantitative ellipsometry microscopy at the silicon-air interface,” Rev. Sci. Instrum. 76, 063701 (2005).
[CrossRef]

Liu, A.

Mendoza-Galván, A.

Merkle, R.

F. Linke and R. Merkle, “Quantitative ellipsometry microscopy at the silicon-air interface,” Rev. Sci. Instrum. 76, 063701 (2005).
[CrossRef]

Opsal, J.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, “Characterization of titanium nitride (TiN) films on various substrate using spectrophotometry, beam profile reflectometry, beam profile ellipsometry, and spectroscopic beam profile ellipsometry,” Thin Solid Films 313-314, 308-313 (1998).
[CrossRef]

Otsuki, S.

Plawsky, J. L.

Press, W. H.

W. H. Press, B. P. Flannery, S. A. Teukolsky, and W. T. Vetterling, “Modeling of data,” in Numerical Recipes in C: The Art of Scientific Computing (Cambridge U. Press, 1988), pp. 517-564.

Pristinski, D.

Ritz, K.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, “Characterization of titanium nitride (TiN) films on various substrate using spectrophotometry, beam profile reflectometry, beam profile ellipsometry, and spectroscopic beam profile ellipsometry,” Thin Solid Films 313-314, 308-313 (1998).
[CrossRef]

See, C. W.

Senko, M.

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, “Characterization of titanium nitride (TiN) films on various substrate using spectrophotometry, beam profile reflectometry, beam profile ellipsometry, and spectroscopic beam profile ellipsometry,” Thin Solid Films 313-314, 308-313 (1998).
[CrossRef]

Siozade, L.

Somekh, M. G.

Sukhishvili, S. A.

Teukolsky, S. A.

W. H. Press, B. P. Flannery, S. A. Teukolsky, and W. T. Vetterling, “Modeling of data,” in Numerical Recipes in C: The Art of Scientific Computing (Cambridge U. Press, 1988), pp. 517-564.

Theeten, J. B.

M. Erman and J. B. Theeten, “Spatially resolved ellipsometry,” J. Appl. Phys. 60, 859-873 (1986).
[CrossRef]

Tompkins, G. G.

G. G. Tompkins, A User's Guide to Ellipsometry (Academic, 1993).

Vetterling, W. T.

W. H. Press, B. P. Flannery, S. A. Teukolsky, and W. T. Vetterling, “Modeling of data,” in Numerical Recipes in C: The Art of Scientific Computing (Cambridge U. Press, 1988), pp. 517-564.

Wagner, P. C.

Ye, S.

S. Ye, Y. K. Kwak, S. H. Cho, Y. J. Cho, and W. Chegal, “Development of a focused-beam ellipsometer based on a new principle,” in Frontiers of Characterization and Metrology for Nanoelectronics, D. G. Seiler, A. C. Diebold, R. McDonald, C. M. Gamer, D. Herr, R. P. Khosla, and E. M. Secula, ed. (American Institute of Physics, 2007), pp. 69-73.

Zaghloul, A. R. M.

Zaghloul, Y. A.

Zerrad, M.

Zhan, Q.

Q. Zhan and J. R. Leger, “Interferometric measurement of Berry's phase in space-variant polarization manipulations,” Opt. Commun. 213, 241-245 (2002).
[CrossRef]

Q. Zhan and J. R. Leger, “Microellipsometer with radial symmetry,” Appl. Opt. 41, 4630-4637 (2002).
[CrossRef]

Appl. Opt.

J. Appl. Phys.

M. Erman and J. B. Theeten, “Spatially resolved ellipsometry,” J. Appl. Phys. 60, 859-873 (1986).
[CrossRef]

J. Opt. Soc. Am. A

J. Phys. D

T. E. Jenkins, “Multiple-angle-of-incidence ellipsometry,” J. Phys. D 32, R45-R56 (1999).
[CrossRef]

Opt. Commun.

Q. Zhan and J. R. Leger, “Interferometric measurement of Berry's phase in space-variant polarization manipulations,” Opt. Commun. 213, 241-245 (2002).
[CrossRef]

Opt. Lett.

Rev. Sci. Instrum.

F. Linke and R. Merkle, “Quantitative ellipsometry microscopy at the silicon-air interface,” Rev. Sci. Instrum. 76, 063701 (2005).
[CrossRef]

Thin Solid Films

J. M. Leng, J. Chen, J. Fanton, M. Senko, K. Ritz, and J. Opsal, “Characterization of titanium nitride (TiN) films on various substrate using spectrophotometry, beam profile reflectometry, beam profile ellipsometry, and spectroscopic beam profile ellipsometry,” Thin Solid Films 313-314, 308-313 (1998).
[CrossRef]

Other

S. Ye, Y. K. Kwak, S. H. Cho, Y. J. Cho, and W. Chegal, “Development of a focused-beam ellipsometer based on a new principle,” in Frontiers of Characterization and Metrology for Nanoelectronics, D. G. Seiler, A. C. Diebold, R. McDonald, C. M. Gamer, D. Herr, R. P. Khosla, and E. M. Secula, ed. (American Institute of Physics, 2007), pp. 69-73.

G. G. Tompkins, A User's Guide to Ellipsometry (Academic, 1993).

J. Humlicek, “Polarized light and ellipsometry,” in Handbook of Ellipsometry, T. Harland and E. A. Irene, eds. (Springer, 2005), pp. 3-90.

R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, 1977).

W. H. Press, B. P. Flannery, S. A. Teukolsky, and W. T. Vetterling, “Modeling of data,” in Numerical Recipes in C: The Art of Scientific Computing (Cambridge U. Press, 1988), pp. 517-564.

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