Abstract

The problem of designing nonpolarizing beam splitters with as broad a spectral band as practical has not been clearly understood. The effort of the work reported here has been to glean understanding from the various results of a contest for such designs and further studies of what might be the underlying principles and behaviors that are involved in such designs. A few key layer patterns have been observed, and the importance of symmetry in these patterns has been discovered. Four-layer building blocks have been found that relate to the two quarter-wave optical thickness pairs used as building blocks in normal- incidence designs.

© 2008 Optical Society of America

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References

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  1. H. A. Macleod, Thin Film Optical Filters, 3rd ed. (Institute of Physics, 2001), p. 368.
  2. P. W. Baumeister, Optical Coating Technology, SPIE Monograph Vol. PM137 (SPIE Press, 2004), pp. 6-29-6-34.
  3. A. Thelen, “Nonpolarizing interference films inside a glass cube,” Appl. Opt. 15, 2983-2985 (1976).
    [CrossRef] [PubMed]
  4. V. R. Costich, “Reduction of polarization effects in interference coatings,” Appl. Opt. 9, 866-870 (1970).
    [CrossRef] [PubMed]
  5. M. Tilsch and K. Hendrix, “Optical Interference Coatings Design Contest 2007: triple bandpass filter and nonpolarizing beam splitter,” Appl Opt. 47, C55-C69 (2008).
    [CrossRef] [PubMed]
  6. R. R. Willey, Practical Design and Production of Optical Thin Films, 2nd ed. (Willey Optical, Consultants, 2002), pp. 47-57.
  7. R. R. Willey, “Design of non-polarizing beamsplitters,” in 51st Annual Technical Conference Proceedings of the Society of Vacuum Coaters (Society of Vacuum Coaters, 2008), pp. 458-462.

2008 (1)

M. Tilsch and K. Hendrix, “Optical Interference Coatings Design Contest 2007: triple bandpass filter and nonpolarizing beam splitter,” Appl Opt. 47, C55-C69 (2008).
[CrossRef] [PubMed]

1976 (1)

1970 (1)

Baumeister, P. W.

P. W. Baumeister, Optical Coating Technology, SPIE Monograph Vol. PM137 (SPIE Press, 2004), pp. 6-29-6-34.

Costich, V. R.

H.,

H. A. Macleod, Thin Film Optical Filters, 3rd ed. (Institute of Physics, 2001), p. 368.

Hendrix, K.

M. Tilsch and K. Hendrix, “Optical Interference Coatings Design Contest 2007: triple bandpass filter and nonpolarizing beam splitter,” Appl Opt. 47, C55-C69 (2008).
[CrossRef] [PubMed]

Macleod,

H. A. Macleod, Thin Film Optical Filters, 3rd ed. (Institute of Physics, 2001), p. 368.

Thelen, A.

Tilsch, M.

M. Tilsch and K. Hendrix, “Optical Interference Coatings Design Contest 2007: triple bandpass filter and nonpolarizing beam splitter,” Appl Opt. 47, C55-C69 (2008).
[CrossRef] [PubMed]

Willey, R. R.

R. R. Willey, “Design of non-polarizing beamsplitters,” in 51st Annual Technical Conference Proceedings of the Society of Vacuum Coaters (Society of Vacuum Coaters, 2008), pp. 458-462.

R. R. Willey, Practical Design and Production of Optical Thin Films, 2nd ed. (Willey Optical, Consultants, 2002), pp. 47-57.

Appl Opt. (1)

M. Tilsch and K. Hendrix, “Optical Interference Coatings Design Contest 2007: triple bandpass filter and nonpolarizing beam splitter,” Appl Opt. 47, C55-C69 (2008).
[CrossRef] [PubMed]

Appl. Opt. (2)

Other (4)

R. R. Willey, Practical Design and Production of Optical Thin Films, 2nd ed. (Willey Optical, Consultants, 2002), pp. 47-57.

R. R. Willey, “Design of non-polarizing beamsplitters,” in 51st Annual Technical Conference Proceedings of the Society of Vacuum Coaters (Society of Vacuum Coaters, 2008), pp. 458-462.

H. A. Macleod, Thin Film Optical Filters, 3rd ed. (Institute of Physics, 2001), p. 368.

P. W. Baumeister, Optical Coating Technology, SPIE Monograph Vol. PM137 (SPIE Press, 2004), pp. 6-29-6-34.

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Figures (16)

Fig. 1
Fig. 1

First two layers of a design showing the split of s and p polarization at 45 ° .

Fig. 2
Fig. 2

Index versus physical thickness profile of the winning design.

Fig. 3
Fig. 3

Index versus physical thickness profile of the second best design.

Fig. 4
Fig. 4

Index versus physical thickness profile of the third best design.

Fig. 5
Fig. 5

Locus in s and p polarizations of four layers in the A type of pattern.

Fig. 6
Fig. 6

Reflectance of an A type of pattern with 2, 4, 6, 8, 10, and 12 sets of four layers showing how (see arrows) the percent reflectance (%R) for s and p polarizations converges at about 10 sets.

Fig. 7
Fig. 7

Index versus thickness profile of the A type of pattern that produces the results in Fig. 6.

Fig. 8
Fig. 8

Reflectance amplitudes for s and p polarizations for a symmetric layer pattern at the wavelength of symmetry ( 498 mn ). The phases at the end of the pattern return to essentially the same points as they started with no net effect at that wavelength and angle.

Fig. 9
Fig. 9

Same as Fig. 8 but at the longer wavelength of 519 nm . The figure shows an increase in reflected amplitude and little change of phase from start to finish of pattern.

Fig. 10
Fig. 10

Index of refraction of one period of the symmetric pattern versus physical thickness.

Fig. 11
Fig. 11

Reflectance of s and p polarizations at 519 nm versus thickness build to match with increasing thickness for six repetitions of the symmetric pattern.

Fig. 12
Fig. 12

Reflection versus wavelength in s and p polarization of the stack in Fig. 11.

Fig. 13
Fig. 13

Index versus thickness profile of the C type of pattern.

Fig. 14
Fig. 14

Locus of RA for the second type of pattern (C) seen in Fig. 13 in p polarization at 45 ° and 550 nm .

Fig. 15
Fig. 15

Nonpolarizing edge filter at 45 ° from the A type of pattern.

Fig. 16
Fig. 16

Nonpolarizing narrow bandpass filter at 45 ° from the A type of pattern.

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