Abstract

A new cost-efficient sputter-slice technology for hard x-ray (1030  keV) Fresnel zone plates fabrication, imposing no limitation to aspect ratio, is proposed. By means of a plasma chemical process, SiO2/Si1xGexO2 glassy film multilayer structures are deposited on a lateral surface of a silica rod, outermost layers being as thin as 100  nm. It has been shown by numerical simulation that for x=0.2 germanium fraction, 100300μm zone plate thickness and the number of zones of about 1000, first order diffraction efficiency as high as 20%–30% at the energy of approximately 20 keV can be achieved.

© 2007 Optical Society of America

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