Abstract

Ion-beam sputtering (IBS) and evaporation are the two deposition techniques that have been used to deposit coatings of Al protected with MgF2 with high reflectance in the vacuum ultraviolet down to 115  nm. Evaporation deposited (ED) Al protected with IBS MgF2 resulted in a larger (smaller) reflectance below (above) 125  nm than the well-known all-evaporated coatings. A similar comparison is obtained when the Al film is deposited by IBS instead of evaporation. The lower reflectance of the coatings protected with IBS versus ED MgF2 above 125  nm is because of larger absorption of the former. Both nonprotected IBS Al, as well as IBS Al protected with ED MgF2, resulted in a band of reflectance loss that was peaked at 127 and 157  nm, respectively. This result was attributed to the excitation of surface plasmons due to the enhancement of surface roughness with large spatial wave vectors in the sputter deposition. This reflectance loss for IBS Al protected with MgF2 is small at the short (λ120  nm) and long (λ>350  nm) wavelengths investigated. IBS Al protected with ED MgF2 is thus a promising coating for these two spectral regions. Coatings protected with IBS MgF2 resulted in a reflectance as high as coatings protected with ED MgF2 at wavelengths longer than 550  nm, whereas the former had a lower reflectance below this wavelength.

© 2007 Optical Society of America

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    [CrossRef]
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    [CrossRef]

2006 (1)

M. Fernández-Perea, J. A. Aznárez, J. Calvo-Angós, J. I. Larruquert, and J. A. Méndez, "Far ultraviolet reflectance variation of MgF2-protected aluminum films under controlled exposure to the main components of the atmosphere," Thin Solid Films 497, 249-253 (2006).
[CrossRef]

2003 (1)

J. I. Larruquert and R. A. M. Keski-Kuha, "Far ultraviolet optical properties of MgF2 films deposited by ion-beam sputtering and their application as protective coatings for Al," Opt. Commun. 215, 93-99 (2003).
[CrossRef]

2002 (1)

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Nonoxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm," Opt. Eng. 41, 1418-1424 (2002).
[CrossRef]

2000 (2)

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, "FUV reflectometer for in situ characterization of thin films deposited under UHV," Proc. SPIE 4139, 92-101 (2000).
[CrossRef]

E. Quesnel, L. Dumas, D. Jacob, and F. Peiró, "Optical and microstructural properties of MgF2 UV coatings grown by ion-beam sputtering process," J. Vac. Sci. Technol. A 18, 2869-2876 (2000).
[CrossRef]

1996 (3)

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, "Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films," Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application," Opt. Commun. 124, 208-215 (1996).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Optical constants of aluminum films in the extreme ultraviolet interval of 82-77 nm," Appl. Opt. 35, 5692-5697 (1996).
[CrossRef] [PubMed]

1995 (1)

1994 (2)

1993 (1)

T. Kiyota, S. Toyoda, K. Tamagawa, and H. Yamakawa, "Aluminum film deposition using an ultrahigh-vacuum sputtering system," Jpn. J. Appl. Phys , Part 1 32, 930-934 (1993).
[CrossRef]

1990 (2)

T. H. Allen, J. P. Lehan, and L. C. McIntyre, Jr., "Ion-beam-sputtered metal fluorides," in Optical Thin Films III: New Developments, R. I. Seddon, ed., Proc. SPIE 1323, 277-290 (1990).
[CrossRef]

J. S. Edmends, C. N. Malde, and S. J. B. Corrigan, "Measurements of the far ultraviolet reflectivity of evaporated aluminium films under exposure to O2, H2O, CO, and CO2," Vacuum 40, 471-475 (1990).
[CrossRef]

1988 (2)

1986 (1)

J. B. Kortright, "Multilayer reflectors for the extreme ultraviolet spectral region," Nucl. Instrum. Methods Phys. Res. A 246, 344-347 (1986).
[CrossRef]

1985 (2)

L. Martinu, H. Biederman, and L. Holland, "Thin films prepared by sputtering MgF2 in an rf planar magnetron," Vacuum 35, 531-535 (1985).
[CrossRef]

E. D. Palik, Handbook of Optical Constants of Solids (Academic, 1985).

1980 (1)

E. Shiles, T. Sasaki, M. Inokuti, and D. Y. Smith, "Self-consistency and sum-rule tests in the Kramers-Kronig analysis of optical data: applications to aluminium," Phys. Rev. B 22, 1612-1628 (1980).
[CrossRef]

1979 (1)

Y. I. Dymshits, V. A. Korobitsyn, and A. A. Metel'nikov, "Effect of heating on the reflectivity of aluminum coatings in the vacuum ultraviolet," Sov. J. Opt. 46, 649-651 (1979).

1977 (1)

P. Croce, "Sur l'effet des couches très minces et des rugosités sur la réflexion, la transmission et la diffusion de la lumière par un dioptre," J. Opt. 8, 127-139 (1977).
[CrossRef]

1975 (1)

1971 (1)

J. G. Endriz and W. E. Spicer, "Study of aluminum films. I. Optical studies of reflectance drops and surface oscillations on controlled-roughness films," Phys. Rev. B 4, 4144-4158 (1971).
[CrossRef]

1969 (1)

G. Jezequel and S. Robin, "Propriétés optiques de l'aluminium évaporé en ultravide entre 500 et 1400 Å," Compt. Rend. Acad. Sci. Paris Sér. B 269, 901-904 (1969).

1967 (1)

1966 (1)

1963 (1)

1961 (2)

1960 (1)

1959 (1)

1948 (1)

S. Tolansky, Multiple-Beam Interferometry of Surfaces and Films (Oxford U. Press, 1948).

Allen, T. H.

T. H. Allen, J. P. Lehan, and L. C. McIntyre, Jr., "Ion-beam-sputtered metal fluorides," in Optical Thin Films III: New Developments, R. I. Seddon, ed., Proc. SPIE 1323, 277-290 (1990).
[CrossRef]

Angel, D. W.

Arakawa, E. T.

Aznárez, J. A.

M. Fernández-Perea, J. A. Aznárez, J. Calvo-Angós, J. I. Larruquert, and J. A. Méndez, "Far ultraviolet reflectance variation of MgF2-protected aluminum films under controlled exposure to the main components of the atmosphere," Thin Solid Films 497, 249-253 (2006).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Nonoxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm," Opt. Eng. 41, 1418-1424 (2002).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, "FUV reflectometer for in situ characterization of thin films deposited under UHV," Proc. SPIE 4139, 92-101 (2000).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application," Opt. Commun. 124, 208-215 (1996).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Optical constants of aluminum films in the extreme ultraviolet interval of 82-77 nm," Appl. Opt. 35, 5692-5697 (1996).
[CrossRef] [PubMed]

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, "Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films," Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Far UV reflectance measurements and optical constants of unoxidized Al films," Appl. Opt. 34, 4892-4899 (1995).
[CrossRef] [PubMed]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Far UV reflectance of UHV prepared Al films and its degradation after exposure to O2," Appl. Opt. 33, 3518-3522 (1994).
[CrossRef] [PubMed]

Berning, P. H.

Biederman, H.

L. Martinu, H. Biederman, and L. Holland, "Thin films prepared by sputtering MgF2 in an rf planar magnetron," Vacuum 35, 531-535 (1985).
[CrossRef]

Blumenstock, G. M.

Calvo-Angós, J.

M. Fernández-Perea, J. A. Aznárez, J. Calvo-Angós, J. I. Larruquert, and J. A. Méndez, "Far ultraviolet reflectance variation of MgF2-protected aluminum films under controlled exposure to the main components of the atmosphere," Thin Solid Films 497, 249-253 (2006).
[CrossRef]

Canfield, L. R.

Corrigan, S. J. B.

J. S. Edmends, C. N. Malde, and S. J. B. Corrigan, "Measurements of the far ultraviolet reflectivity of evaporated aluminium films under exposure to O2, H2O, CO, and CO2," Vacuum 40, 471-475 (1990).
[CrossRef]

Croce, P.

P. Croce, "Sur l'effet des couches très minces et des rugosités sur la réflexion, la transmission et la diffusion de la lumière par un dioptre," J. Opt. 8, 127-139 (1977).
[CrossRef]

Dumas, L.

E. Quesnel, L. Dumas, D. Jacob, and F. Peiró, "Optical and microstructural properties of MgF2 UV coatings grown by ion-beam sputtering process," J. Vac. Sci. Technol. A 18, 2869-2876 (2000).
[CrossRef]

Dymshits, Y. I.

Y. I. Dymshits, V. A. Korobitsyn, and A. A. Metel'nikov, "Effect of heating on the reflectivity of aluminum coatings in the vacuum ultraviolet," Sov. J. Opt. 46, 649-651 (1979).

Edmends, J. S.

J. S. Edmends, C. N. Malde, and S. J. B. Corrigan, "Measurements of the far ultraviolet reflectivity of evaporated aluminium films under exposure to O2, H2O, CO, and CO2," Vacuum 40, 471-475 (1990).
[CrossRef]

Endriz, J. G.

J. G. Endriz and W. E. Spicer, "Study of aluminum films. I. Optical studies of reflectance drops and surface oscillations on controlled-roughness films," Phys. Rev. B 4, 4144-4158 (1971).
[CrossRef]

Fernández-Perea, M.

M. Fernández-Perea, J. A. Aznárez, J. Calvo-Angós, J. I. Larruquert, and J. A. Méndez, "Far ultraviolet reflectance variation of MgF2-protected aluminum films under controlled exposure to the main components of the atmosphere," Thin Solid Films 497, 249-253 (2006).
[CrossRef]

Gum, J. S.

Hass, G.

Herzig, H.

Holland, L.

L. Martinu, H. Biederman, and L. Holland, "Thin films prepared by sputtering MgF2 in an rf planar magnetron," Vacuum 35, 531-535 (1985).
[CrossRef]

Hunter, W. R.

Inokuti, M.

E. Shiles, T. Sasaki, M. Inokuti, and D. Y. Smith, "Self-consistency and sum-rule tests in the Kramers-Kronig analysis of optical data: applications to aluminium," Phys. Rev. B 22, 1612-1628 (1980).
[CrossRef]

Jacob, D.

E. Quesnel, L. Dumas, D. Jacob, and F. Peiró, "Optical and microstructural properties of MgF2 UV coatings grown by ion-beam sputtering process," J. Vac. Sci. Technol. A 18, 2869-2876 (2000).
[CrossRef]

Jezequel, G.

G. Jezequel and S. Robin, "Propriétés optiques de l'aluminium évaporé en ultravide entre 500 et 1400 Å," Compt. Rend. Acad. Sci. Paris Sér. B 269, 901-904 (1969).

Keski-Kuha, R. A. M.

J. I. Larruquert and R. A. M. Keski-Kuha, "Far ultraviolet optical properties of MgF2 films deposited by ion-beam sputtering and their application as protective coatings for Al," Opt. Commun. 215, 93-99 (2003).
[CrossRef]

G. M. Blumenstock and R. A. M. Keski-Kuha, "Ion-beam-deposited boron carbide coatings for extreme ultraviolet," Appl. Opt. 33, 5962-5963 (1994).
[CrossRef] [PubMed]

R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, and A. R. Toft, "Normal incidence reflectance of ion beam deposited SiC films in the EUV," Appl. Opt. 27, 2815-2816 (1988).
[CrossRef] [PubMed]

R. A. M. Keski-Kuha (private communication).

Kiyota, T.

T. Kiyota, S. Toyoda, K. Tamagawa, and H. Yamakawa, "Aluminum film deposition using an ultrahigh-vacuum sputtering system," Jpn. J. Appl. Phys , Part 1 32, 930-934 (1993).
[CrossRef]

Korobitsyn, V. A.

Y. I. Dymshits, V. A. Korobitsyn, and A. A. Metel'nikov, "Effect of heating on the reflectivity of aluminum coatings in the vacuum ultraviolet," Sov. J. Opt. 46, 649-651 (1979).

Kortright, J. B.

J. B. Kortright and D. L. Windt, "Amorphous silicon carbide coatings for extreme ultraviolet optics," Appl. Opt. 27, 2841-2846 (1988).
[CrossRef] [PubMed]

J. B. Kortright, "Multilayer reflectors for the extreme ultraviolet spectral region," Nucl. Instrum. Methods Phys. Res. A 246, 344-347 (1986).
[CrossRef]

Kretschmann, E.

Kröger, E.

Larruquert, J. I.

M. Fernández-Perea, J. A. Aznárez, J. Calvo-Angós, J. I. Larruquert, and J. A. Méndez, "Far ultraviolet reflectance variation of MgF2-protected aluminum films under controlled exposure to the main components of the atmosphere," Thin Solid Films 497, 249-253 (2006).
[CrossRef]

J. I. Larruquert and R. A. M. Keski-Kuha, "Far ultraviolet optical properties of MgF2 films deposited by ion-beam sputtering and their application as protective coatings for Al," Opt. Commun. 215, 93-99 (2003).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Nonoxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm," Opt. Eng. 41, 1418-1424 (2002).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, "FUV reflectometer for in situ characterization of thin films deposited under UHV," Proc. SPIE 4139, 92-101 (2000).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application," Opt. Commun. 124, 208-215 (1996).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Optical constants of aluminum films in the extreme ultraviolet interval of 82-77 nm," Appl. Opt. 35, 5692-5697 (1996).
[CrossRef] [PubMed]

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, "Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films," Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Far UV reflectance measurements and optical constants of unoxidized Al films," Appl. Opt. 34, 4892-4899 (1995).
[CrossRef] [PubMed]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Far UV reflectance of UHV prepared Al films and its degradation after exposure to O2," Appl. Opt. 33, 3518-3522 (1994).
[CrossRef] [PubMed]

Lehan, J. P.

T. H. Allen, J. P. Lehan, and L. C. McIntyre, Jr., "Ion-beam-sputtered metal fluorides," in Optical Thin Films III: New Developments, R. I. Seddon, ed., Proc. SPIE 1323, 277-290 (1990).
[CrossRef]

Madden, R. P.

Malde, C. N.

J. S. Edmends, C. N. Malde, and S. J. B. Corrigan, "Measurements of the far ultraviolet reflectivity of evaporated aluminium films under exposure to O2, H2O, CO, and CO2," Vacuum 40, 471-475 (1990).
[CrossRef]

Martinu, L.

L. Martinu, H. Biederman, and L. Holland, "Thin films prepared by sputtering MgF2 in an rf planar magnetron," Vacuum 35, 531-535 (1985).
[CrossRef]

McIntyre, L. C.

T. H. Allen, J. P. Lehan, and L. C. McIntyre, Jr., "Ion-beam-sputtered metal fluorides," in Optical Thin Films III: New Developments, R. I. Seddon, ed., Proc. SPIE 1323, 277-290 (1990).
[CrossRef]

Méndez, J. A.

M. Fernández-Perea, J. A. Aznárez, J. Calvo-Angós, J. I. Larruquert, and J. A. Méndez, "Far ultraviolet reflectance variation of MgF2-protected aluminum films under controlled exposure to the main components of the atmosphere," Thin Solid Films 497, 249-253 (2006).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Nonoxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm," Opt. Eng. 41, 1418-1424 (2002).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, "FUV reflectometer for in situ characterization of thin films deposited under UHV," Proc. SPIE 4139, 92-101 (2000).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application," Opt. Commun. 124, 208-215 (1996).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Optical constants of aluminum films in the extreme ultraviolet interval of 82-77 nm," Appl. Opt. 35, 5692-5697 (1996).
[CrossRef] [PubMed]

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, "Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films," Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Far UV reflectance measurements and optical constants of unoxidized Al films," Appl. Opt. 34, 4892-4899 (1995).
[CrossRef] [PubMed]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Far UV reflectance of UHV prepared Al films and its degradation after exposure to O2," Appl. Opt. 33, 3518-3522 (1994).
[CrossRef] [PubMed]

Metel'nikov, A. A.

Y. I. Dymshits, V. A. Korobitsyn, and A. A. Metel'nikov, "Effect of heating on the reflectivity of aluminum coatings in the vacuum ultraviolet," Sov. J. Opt. 46, 649-651 (1979).

Osantowski, J. F.

Palik, E. D.

E. D. Palik, Handbook of Optical Constants of Solids (Academic, 1985).

Peiró, F.

E. Quesnel, L. Dumas, D. Jacob, and F. Peiró, "Optical and microstructural properties of MgF2 UV coatings grown by ion-beam sputtering process," J. Vac. Sci. Technol. A 18, 2869-2876 (2000).
[CrossRef]

Quesnel, E.

E. Quesnel, L. Dumas, D. Jacob, and F. Peiró, "Optical and microstructural properties of MgF2 UV coatings grown by ion-beam sputtering process," J. Vac. Sci. Technol. A 18, 2869-2876 (2000).
[CrossRef]

Robin, S.

G. Jezequel and S. Robin, "Propriétés optiques de l'aluminium évaporé en ultravide entre 500 et 1400 Å," Compt. Rend. Acad. Sci. Paris Sér. B 269, 901-904 (1969).

Sasaki, T.

E. Shiles, T. Sasaki, M. Inokuti, and D. Y. Smith, "Self-consistency and sum-rule tests in the Kramers-Kronig analysis of optical data: applications to aluminium," Phys. Rev. B 22, 1612-1628 (1980).
[CrossRef]

Shiles, E.

E. Shiles, T. Sasaki, M. Inokuti, and D. Y. Smith, "Self-consistency and sum-rule tests in the Kramers-Kronig analysis of optical data: applications to aluminium," Phys. Rev. B 22, 1612-1628 (1980).
[CrossRef]

Smith, D. Y.

E. Shiles, T. Sasaki, M. Inokuti, and D. Y. Smith, "Self-consistency and sum-rule tests in the Kramers-Kronig analysis of optical data: applications to aluminium," Phys. Rev. B 22, 1612-1628 (1980).
[CrossRef]

Spicer, W. E.

J. G. Endriz and W. E. Spicer, "Study of aluminum films. I. Optical studies of reflectance drops and surface oscillations on controlled-roughness films," Phys. Rev. B 4, 4144-4158 (1971).
[CrossRef]

Stanford, J. L.

Tamagawa, K.

T. Kiyota, S. Toyoda, K. Tamagawa, and H. Yamakawa, "Aluminum film deposition using an ultrahigh-vacuum sputtering system," Jpn. J. Appl. Phys , Part 1 32, 930-934 (1993).
[CrossRef]

Toft, A. R.

Tolansky, S.

S. Tolansky, Multiple-Beam Interferometry of Surfaces and Films (Oxford U. Press, 1948).

Tousey, R.

Toyoda, S.

T. Kiyota, S. Toyoda, K. Tamagawa, and H. Yamakawa, "Aluminum film deposition using an ultrahigh-vacuum sputtering system," Jpn. J. Appl. Phys , Part 1 32, 930-934 (1993).
[CrossRef]

Vehse, R. C.

Waylonis, J. E.

Windt, D. L.

Yamakawa, H.

T. Kiyota, S. Toyoda, K. Tamagawa, and H. Yamakawa, "Aluminum film deposition using an ultrahigh-vacuum sputtering system," Jpn. J. Appl. Phys , Part 1 32, 930-934 (1993).
[CrossRef]

Appl. Opt. (7)

Compt. Rend. Acad. Sci. Paris Sér. B (1)

G. Jezequel and S. Robin, "Propriétés optiques de l'aluminium évaporé en ultravide entre 500 et 1400 Å," Compt. Rend. Acad. Sci. Paris Sér. B 269, 901-904 (1969).

J. Opt. (1)

P. Croce, "Sur l'effet des couches très minces et des rugosités sur la réflexion, la transmission et la diffusion de la lumière par un dioptre," J. Opt. 8, 127-139 (1977).
[CrossRef]

J. Opt. Soc. Am. (7)

J. Vac. Sci. Technol. A (1)

E. Quesnel, L. Dumas, D. Jacob, and F. Peiró, "Optical and microstructural properties of MgF2 UV coatings grown by ion-beam sputtering process," J. Vac. Sci. Technol. A 18, 2869-2876 (2000).
[CrossRef]

Jpn. J. Appl. Phys (1)

T. Kiyota, S. Toyoda, K. Tamagawa, and H. Yamakawa, "Aluminum film deposition using an ultrahigh-vacuum sputtering system," Jpn. J. Appl. Phys , Part 1 32, 930-934 (1993).
[CrossRef]

Nucl. Instrum. Methods Phys. Res. A (1)

J. B. Kortright, "Multilayer reflectors for the extreme ultraviolet spectral region," Nucl. Instrum. Methods Phys. Res. A 246, 344-347 (1986).
[CrossRef]

Opt. Commun. (2)

J. I. Larruquert and R. A. M. Keski-Kuha, "Far ultraviolet optical properties of MgF2 films deposited by ion-beam sputtering and their application as protective coatings for Al," Opt. Commun. 215, 93-99 (2003).
[CrossRef]

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Degradation of far ultraviolet reflectance of aluminum films exposed to atomic oxygen. In-orbit coating application," Opt. Commun. 124, 208-215 (1996).
[CrossRef]

Opt. Eng. (1)

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez, "Nonoxidized Al-overcoated Ir bilayers with high reflectance in the extreme ultraviolet above 50 nm," Opt. Eng. 41, 1418-1424 (2002).
[CrossRef]

Phys. Rev. B (2)

J. G. Endriz and W. E. Spicer, "Study of aluminum films. I. Optical studies of reflectance drops and surface oscillations on controlled-roughness films," Phys. Rev. B 4, 4144-4158 (1971).
[CrossRef]

E. Shiles, T. Sasaki, M. Inokuti, and D. Y. Smith, "Self-consistency and sum-rule tests in the Kramers-Kronig analysis of optical data: applications to aluminium," Phys. Rev. B 22, 1612-1628 (1980).
[CrossRef]

Proc. SPIE (2)

T. H. Allen, J. P. Lehan, and L. C. McIntyre, Jr., "Ion-beam-sputtered metal fluorides," in Optical Thin Films III: New Developments, R. I. Seddon, ed., Proc. SPIE 1323, 277-290 (1990).
[CrossRef]

J. I. Larruquert, J. A. Aznárez, and J. A. Méndez, "FUV reflectometer for in situ characterization of thin films deposited under UHV," Proc. SPIE 4139, 92-101 (2000).
[CrossRef]

Rev. Sci. Instrum. (1)

J. A. Aznárez, J. I. Larruquert, and J. A. Méndez, "Far-ultraviolet absolute reflectometer for optical constant determination of ultrahigh vacuum prepared thin films," Rev. Sci. Instrum. 67, 497-502 (1996).
[CrossRef]

Sov. J. Opt. (1)

Y. I. Dymshits, V. A. Korobitsyn, and A. A. Metel'nikov, "Effect of heating on the reflectivity of aluminum coatings in the vacuum ultraviolet," Sov. J. Opt. 46, 649-651 (1979).

Thin Solid Films (1)

M. Fernández-Perea, J. A. Aznárez, J. Calvo-Angós, J. I. Larruquert, and J. A. Méndez, "Far ultraviolet reflectance variation of MgF2-protected aluminum films under controlled exposure to the main components of the atmosphere," Thin Solid Films 497, 249-253 (2006).
[CrossRef]

Vacuum (2)

L. Martinu, H. Biederman, and L. Holland, "Thin films prepared by sputtering MgF2 in an rf planar magnetron," Vacuum 35, 531-535 (1985).
[CrossRef]

J. S. Edmends, C. N. Malde, and S. J. B. Corrigan, "Measurements of the far ultraviolet reflectivity of evaporated aluminium films under exposure to O2, H2O, CO, and CO2," Vacuum 40, 471-475 (1990).
[CrossRef]

Other (3)

E. D. Palik, Handbook of Optical Constants of Solids (Academic, 1985).

R. A. M. Keski-Kuha (private communication).

S. Tolansky, Multiple-Beam Interferometry of Surfaces and Films (Oxford U. Press, 1948).

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Figures (5)

Fig. 1
Fig. 1

(Color online) In situ near-normal reflectance of a nonprotected Al film prepared both by IBS and by evaporation (ED). The calculated reflectance of a smooth Al surface is also displayed.

Fig. 2
Fig. 2

(Color online) Reflectance of an Al film deposited by IBS and the reflectance calculated with Croce's model with the indicated roughness parameters. The calculated reflectance of a smooth Al surface is also displayed.

Fig. 3
Fig. 3

(Color online) Reflectance of all combinations of IBS and ED Al protected with MgF 2 . Solid curve, ED Al. Dashed curve, IBS MgF 2 . Dots, ED MgF 2 . Crosses, IBS MgF 2 .

Fig. 4
Fig. 4

(Color online) Reflectance of an Al film deposited by IBS that was protected with a MgF 2 film deposited by evaporation (ED), and the reflectance calculated with Croce's model with the indicated roughness parameters. The calculated reflectance of a bilayer with smooth surfaces is also displayed.

Fig. 5
Fig. 5

(Color online) Reflectance of the four types of Al / MgF 2 coatings in the VUV to NIR versus the logarithm of wavelength.

Equations (4)

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λ sp = λ p 1 + ε ,
r = r 0 [ 1 + A d 2 k g ( k ) B ] ,
t = t 0 [ 1 + A d 2 k g ( k ) B ] ,
g ( k ) = π σ 2 T 2   exp ( k 2 T 2 4 ) ,

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