Abstract

High-performance coatings for micromechanical mirrors were developed. The high-reflective metal systems can be integrated into the technology of MOEMS, such as spatial light modulators and microscanning mirrors from the near-infrared down to the vacuum-ultraviolet spectral regions. The reported metal designs permit high optical performances to be merged with suitable mechanical properties and fitting complementary metal-oxide semiconductor compatibility.

© 2006 Optical Society of America

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  1. U. Ljungblad, U. Dauderstädt, P. Dürr, T. Sandström, H. Buhre, and H. Lakner, 'New laser pattern generator for DUV using spatial light modulator,' Microelectron. Eng. 57-58, 23-29 (2001).
    [CrossRef]
  2. T. Sandström, U. B. Ljungblad, P. Dürr, and H. Lakner, 'High-performance laser pattern generation using spatial light modulators (SLM) and deep-UV radiation, inEmerging Lithographic Technologies V, E. A. Dobisz and R. L. Engelstad,eds. Proc. SPIE 4343, 35-45 (2001).
  3. R. Thielsch, 'Optical coatings for the DUV/VUV,' in Interference Coatings, N. Kaiser and H. K. Pulker, eds., Vol. 88 of Springer Series in Optical Sciences (Springer, 2003), pp. 257-279.
  4. J. Heber, A. Gatto, and N. Kaiser, 'Spectrophotometer in the vacuum UV,' in Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, G. J. Exarhos, A. H. Guenther, N. Kaiser, K. L. Lewis, M. J. Soileau, C. J. Stolz, A. Giesen, and H. Weber, eds., SPIE 4932, 544-548 (2002).
    [CrossRef]

2002 (1)

J. Heber, A. Gatto, and N. Kaiser, 'Spectrophotometer in the vacuum UV,' in Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, G. J. Exarhos, A. H. Guenther, N. Kaiser, K. L. Lewis, M. J. Soileau, C. J. Stolz, A. Giesen, and H. Weber, eds., SPIE 4932, 544-548 (2002).
[CrossRef]

2001 (2)

U. Ljungblad, U. Dauderstädt, P. Dürr, T. Sandström, H. Buhre, and H. Lakner, 'New laser pattern generator for DUV using spatial light modulator,' Microelectron. Eng. 57-58, 23-29 (2001).
[CrossRef]

T. Sandström, U. B. Ljungblad, P. Dürr, and H. Lakner, 'High-performance laser pattern generation using spatial light modulators (SLM) and deep-UV radiation, inEmerging Lithographic Technologies V, E. A. Dobisz and R. L. Engelstad,eds. Proc. SPIE 4343, 35-45 (2001).

Buhre, H.

U. Ljungblad, U. Dauderstädt, P. Dürr, T. Sandström, H. Buhre, and H. Lakner, 'New laser pattern generator for DUV using spatial light modulator,' Microelectron. Eng. 57-58, 23-29 (2001).
[CrossRef]

Dauderstädt, U.

U. Ljungblad, U. Dauderstädt, P. Dürr, T. Sandström, H. Buhre, and H. Lakner, 'New laser pattern generator for DUV using spatial light modulator,' Microelectron. Eng. 57-58, 23-29 (2001).
[CrossRef]

Dürr, P.

U. Ljungblad, U. Dauderstädt, P. Dürr, T. Sandström, H. Buhre, and H. Lakner, 'New laser pattern generator for DUV using spatial light modulator,' Microelectron. Eng. 57-58, 23-29 (2001).
[CrossRef]

T. Sandström, U. B. Ljungblad, P. Dürr, and H. Lakner, 'High-performance laser pattern generation using spatial light modulators (SLM) and deep-UV radiation, inEmerging Lithographic Technologies V, E. A. Dobisz and R. L. Engelstad,eds. Proc. SPIE 4343, 35-45 (2001).

Gatto, A.

J. Heber, A. Gatto, and N. Kaiser, 'Spectrophotometer in the vacuum UV,' in Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, G. J. Exarhos, A. H. Guenther, N. Kaiser, K. L. Lewis, M. J. Soileau, C. J. Stolz, A. Giesen, and H. Weber, eds., SPIE 4932, 544-548 (2002).
[CrossRef]

Heber, J.

J. Heber, A. Gatto, and N. Kaiser, 'Spectrophotometer in the vacuum UV,' in Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, G. J. Exarhos, A. H. Guenther, N. Kaiser, K. L. Lewis, M. J. Soileau, C. J. Stolz, A. Giesen, and H. Weber, eds., SPIE 4932, 544-548 (2002).
[CrossRef]

Kaiser, N.

J. Heber, A. Gatto, and N. Kaiser, 'Spectrophotometer in the vacuum UV,' in Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, G. J. Exarhos, A. H. Guenther, N. Kaiser, K. L. Lewis, M. J. Soileau, C. J. Stolz, A. Giesen, and H. Weber, eds., SPIE 4932, 544-548 (2002).
[CrossRef]

Lakner, H.

T. Sandström, U. B. Ljungblad, P. Dürr, and H. Lakner, 'High-performance laser pattern generation using spatial light modulators (SLM) and deep-UV radiation, inEmerging Lithographic Technologies V, E. A. Dobisz and R. L. Engelstad,eds. Proc. SPIE 4343, 35-45 (2001).

U. Ljungblad, U. Dauderstädt, P. Dürr, T. Sandström, H. Buhre, and H. Lakner, 'New laser pattern generator for DUV using spatial light modulator,' Microelectron. Eng. 57-58, 23-29 (2001).
[CrossRef]

Ljungblad, U.

U. Ljungblad, U. Dauderstädt, P. Dürr, T. Sandström, H. Buhre, and H. Lakner, 'New laser pattern generator for DUV using spatial light modulator,' Microelectron. Eng. 57-58, 23-29 (2001).
[CrossRef]

Ljungblad, U. B.

T. Sandström, U. B. Ljungblad, P. Dürr, and H. Lakner, 'High-performance laser pattern generation using spatial light modulators (SLM) and deep-UV radiation, inEmerging Lithographic Technologies V, E. A. Dobisz and R. L. Engelstad,eds. Proc. SPIE 4343, 35-45 (2001).

Sandström, T.

T. Sandström, U. B. Ljungblad, P. Dürr, and H. Lakner, 'High-performance laser pattern generation using spatial light modulators (SLM) and deep-UV radiation, inEmerging Lithographic Technologies V, E. A. Dobisz and R. L. Engelstad,eds. Proc. SPIE 4343, 35-45 (2001).

U. Ljungblad, U. Dauderstädt, P. Dürr, T. Sandström, H. Buhre, and H. Lakner, 'New laser pattern generator for DUV using spatial light modulator,' Microelectron. Eng. 57-58, 23-29 (2001).
[CrossRef]

Thielsch, R.

R. Thielsch, 'Optical coatings for the DUV/VUV,' in Interference Coatings, N. Kaiser and H. K. Pulker, eds., Vol. 88 of Springer Series in Optical Sciences (Springer, 2003), pp. 257-279.

Microelectron. Eng. (1)

U. Ljungblad, U. Dauderstädt, P. Dürr, T. Sandström, H. Buhre, and H. Lakner, 'New laser pattern generator for DUV using spatial light modulator,' Microelectron. Eng. 57-58, 23-29 (2001).
[CrossRef]

Proc. SPIE (1)

T. Sandström, U. B. Ljungblad, P. Dürr, and H. Lakner, 'High-performance laser pattern generation using spatial light modulators (SLM) and deep-UV radiation, inEmerging Lithographic Technologies V, E. A. Dobisz and R. L. Engelstad,eds. Proc. SPIE 4343, 35-45 (2001).

SPIE (1)

J. Heber, A. Gatto, and N. Kaiser, 'Spectrophotometer in the vacuum UV,' in Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, G. J. Exarhos, A. H. Guenther, N. Kaiser, K. L. Lewis, M. J. Soileau, C. J. Stolz, A. Giesen, and H. Weber, eds., SPIE 4932, 544-548 (2002).
[CrossRef]

Other (1)

R. Thielsch, 'Optical coatings for the DUV/VUV,' in Interference Coatings, N. Kaiser and H. K. Pulker, eds., Vol. 88 of Springer Series in Optical Sciences (Springer, 2003), pp. 257-279.

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Figures (6)

Fig. 1
Fig. 1

Actuated micromirrors.

Fig. 2
Fig. 2

Nomarski image of the 16 μm × 16 μm pixel device.

Fig. 3
Fig. 3

Enhanced aluminum system for 157 and 193 nm on the silicon substrate for comparison with the unprotected aluminum coating. R, reflectivity; total thickness, <100 nm; total stress, <150 Mpa.

Fig. 4
Fig. 4

Enhanced aluminum coatings with fluoride capping layers.

Fig. 5
Fig. 5

Enhanced aluminum coatings with oxide capping layers.

Fig. 6
Fig. 6

Interferometric surface topography of an optimized 16 μm × 16 μm multilayer micromirror with a center post before (left) and after (right) the laser irradiation test. The rms deformation of the free-standing multilayer mirror is 3.0 nm before and 2.3 nm after laser irradiation with an ArF excimer laser (wavelength, 193 nm; 107 pulses; pulse duration, 12 ns; pulse energy, 100 μJ∕cm2).

Tables (3)

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Table 1 Targeted Wavelengths for Next-Generation Micromirror Optical Systems

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Table 2 Reflectance of Enhanced Aluminum Coatings for Micromirror Arrays

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Table 3 CMOS Process Compatibility of the Different Coatings a

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