Abstract

The new and fast scatterometry method called optical diffraction microscopy is compared with atomic-force microscopy by use of cross-section scanning-electron microscope images as references. The sample is a high-aspect-ratio grating with a period of 1000  nm. To allow the atomic-force microscope to track all parts of the grating profile, the grating is investigated at different tilt angles. The measured quantities of the profile include sidewall angle γ(90°), groove height h(2000  nm), and degree of filling f(40%). The two methods, which respond to quite different material properties, give consistent results within standard uncertainties of u(γ)0.8°, u(h)15  nm, and u(f)1%.

© 2006 Optical Society of America

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