Abstract

We describe the design, fabrication, and excellent performance of an optimized deep-etched high-density fused-silica transmission grating for use in dense wavelength division multiplexing (DWDM) systems. The fabricated optimized transmission grating exhibits an efficiency of 87.1% at a wavelength of 1550 nm. Inductively coupled plasma-etching technology was used to fabricate the grating. The deep-etched high-density fused-silica transmission grating is suitable for use in a DWDM system because of its high efficiency, low polarization-dependent loss, parallel demultiplexing, and stable optical performance. The fabricated deep-etched high-density fused-silica transmission gratings should play an important role in DWDM systems.

© 2006 Optical Society of America

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2005

2003

2002

2001

A. Sappey and P. Huang, " Free-space diffraction gratings allow denser channel spacing," Wavelength Division Multiplexing Solutions Res. Dev. 3, 39- 41 ( 2001).

2000

E. Gogolides and P. Vauvert, " Etching of SiO2 and Si in fluorocarbon plasma: A detailed surface model accounting for etching and deposition," J. Appl. Phys. 88, 5570- 5584 ( 2000).

J. N. Mait, A. Scherer, O. Dial, D. W. Prather, and X. Gao, " Diffractive lens fabricated with binary features less than 60 nm," Opt. Lett. 25, 381- 383 ( 2000).

1997

1995

Bouchut, P.

Boyd, R. D.

Britten, J. A.

Bryan, S. J.

Chen, R. T.

Clausnitzer, T.

Dial, O.

Fuchs, H. J.

Gaborit, G.

Gao, X.

Gaylord, T. K.

Gogolides, E.

E. Gogolides and P. Vauvert, " Etching of SiO2 and Si in fluorocarbon plasma: A detailed surface model accounting for etching and deposition," J. Appl. Phys. 88, 5570- 5584 ( 2000).

Grann, E. B.

Hirsh, J.

Horwitz, J. W.

Huang, P.

A. Sappey and P. Huang, " Free-space diffraction gratings allow denser channel spacing," Wavelength Division Multiplexing Solutions Res. Dev. 3, 39- 41 ( 2001).

Journot, E.

Jup, M.

Kley, E. B.

Laude, J. -P.

J. -P. Laude, DWDM Fundamentals, Components, and Applications (Artech House Optoelectronics Library, 2002).

Li, L.

Limpert, J.

Liu, L.

Mait, J. N.

Moharam, M. G.

Morey, W. W.

Néauport, J.

Nguyen, H. T.

Perry, M. D.

Pommet, D. A.

Prather, D. W.

Qiao, J.

Ristau, D.

Sappey, A.

A. Sappey, " Not all multiplexing technologies are on the same wavelength," Photonics Spectra 36, 78- 84 ( 2002).

A. Sappey and P. Huang, " Free-space diffraction gratings allow denser channel spacing," Wavelength Division Multiplexing Solutions Res. Dev. 3, 39- 41 ( 2001).

Scherer, A.

Shore, B. W.

Tünnermann, A.

Vauvert, P.

E. Gogolides and P. Vauvert, " Etching of SiO2 and Si in fluorocarbon plasma: A detailed surface model accounting for etching and deposition," J. Appl. Phys. 88, 5570- 5584 ( 2000).

Wang, S.

Zellmer, H.

Zhang, Y.

Zhao, F.

Zhou, C.

Zöllner, K.

Appl. Opt.

J. Appl. Phys.

E. Gogolides and P. Vauvert, " Etching of SiO2 and Si in fluorocarbon plasma: A detailed surface model accounting for etching and deposition," J. Appl. Phys. 88, 5570- 5584 ( 2000).

J. Opt. Soc. Am. A

Opt. Lett.

Photonics Spectra

A. Sappey, " Not all multiplexing technologies are on the same wavelength," Photonics Spectra 36, 78- 84 ( 2002).

Wavelength Division Multiplexing Solutions Res. Dev.

A. Sappey and P. Huang, " Free-space diffraction gratings allow denser channel spacing," Wavelength Division Multiplexing Solutions Res. Dev. 3, 39- 41 ( 2001).

Other

J. -P. Laude, DWDM Fundamentals, Components, and Applications (Artech House Optoelectronics Library, 2002).

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