Abstract

The total loss that can be suffered by an antireflection (AR) coating consists of reflectance loss, absorption loss, and scatter loss. To separate these losses we developed a calorimetric absorption measurement apparatus and an ellipsoidal Coblentz hemisphere based scatterometer for 157-nm optics. Reflectance, absorption, and scatter of AR coatings were measured with these apparatuses. The AR coating samples were supplied by Japanese vendors. Each AR coating as supplied was coated with the vendor’s coating design by that vendor’s coating process. Our measurement apparatuses, methods, and results for these AR coatings are presented here.

© 2002 Optical Society of America

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  2. D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.
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2001

O. Apel, K. Mann, “DUV scattering measurements as a tool for characterization of UV-optical surfaces,” Appl. Phys. A 72, 59–65 (2001).
[CrossRef]

2000

1996

Amra, C.

Apel, O.

O. Apel, K. Mann, “DUV scattering measurements as a tool for characterization of UV-optical surfaces,” Appl. Phys. A 72, 59–65 (2001).
[CrossRef]

Bennet, J. M.

Biro, R.

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

Bosch, S.

S. Gunster, D. Ristau, S. Bosch, A. Duparre, E. Masetti, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “Optical and structural properties for the UV/VUV-spactral range,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB1-1–ThB1-3.

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

Commandre, M.

Deumie, C.

Duparre, A.

J. Ferre-Borrull, A. Duparre, E. Quesnel, “Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm,” Appl. Opt. 39, 5854–5864 (2000).
[CrossRef]

P. Kadkhoda, A. Muller, D. Ristau, A. Duparre, S. Gliech, H. Lauth, U. Schuhmann, N. Reng, M. Tilsch, R. Schuhmann, C. Amra, C. Deumie, C. Jolie, H. Kessler, T. Lindstrom, C. G. Ribbing, J. M. Bennet, “International round-robin experiment to test the International Organization for Standardization total-scattering draft standard,” Appl. Opt. 39, 3321–3332 (2000).
[CrossRef]

A. Duparre, “Roughness and scattering of coatings for DUV to EUV spectral regions,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington D.C., 2001), pp. ThA2–1–ThA2–3.

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

S. Gunster, D. Ristau, S. Bosch, A. Duparre, E. Masetti, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “Optical and structural properties for the UV/VUV-spactral range,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB1-1–ThB1-3.

J. Steinert, S. Gliech, M. Flemming, A. Duparre, “Instrument for light scatter measurements at 157nm and 193nm,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA8–1–ThA8–3.

Efremow, M. N.

V. Liberman, M. Rothschild, M. N. Efremow, S. T. Palmacci, J. H. C. Sedlacek, C. Van Peski, K. Orvek, “Marathon evaluation of optical materials for 157-nm lithography,” in Optical Microlithography XIV, C. J. Progler, ed., Proc. SPIE4346, 45–51 (2001).

Ferre-Borrull, J.

J. Ferre-Borrull, A. Duparre, E. Quesnel, “Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm,” Appl. Opt. 39, 5854–5864 (2000).
[CrossRef]

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

Flemming, M.

J. Steinert, S. Gliech, M. Flemming, A. Duparre, “Instrument for light scatter measurements at 157nm and 193nm,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA8–1–ThA8–3.

Gliech, S.

P. Kadkhoda, A. Muller, D. Ristau, A. Duparre, S. Gliech, H. Lauth, U. Schuhmann, N. Reng, M. Tilsch, R. Schuhmann, C. Amra, C. Deumie, C. Jolie, H. Kessler, T. Lindstrom, C. G. Ribbing, J. M. Bennet, “International round-robin experiment to test the International Organization for Standardization total-scattering draft standard,” Appl. Opt. 39, 3321–3332 (2000).
[CrossRef]

J. Steinert, S. Gliech, M. Flemming, A. Duparre, “Instrument for light scatter measurements at 157nm and 193nm,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA8–1–ThA8–3.

Gunster, S.

S. Gunster, D. Ristau, S. Bosch, A. Duparre, E. Masetti, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “Optical and structural properties for the UV/VUV-spactral range,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB1-1–ThB1-3.

S. Gunster, P. Kadkhoda, D. Ristau, “Online spectrophotometric characterisation of MgF2/LaF3-fluoride multilayer coatings production,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ME9-1–ME9-3.

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

Hasegawa, M.

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

C. Ouchi, M. Hasegawa, A. Matsumoto, K. Sone, “Measurement of absorptance of optical coatings for F2 lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 7–12 (2001).

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

Jolie, C.

Kadkhoda, P.

P. Kadkhoda, A. Muller, D. Ristau, A. Duparre, S. Gliech, H. Lauth, U. Schuhmann, N. Reng, M. Tilsch, R. Schuhmann, C. Amra, C. Deumie, C. Jolie, H. Kessler, T. Lindstrom, C. G. Ribbing, J. M. Bennet, “International round-robin experiment to test the International Organization for Standardization total-scattering draft standard,” Appl. Opt. 39, 3321–3332 (2000).
[CrossRef]

S. Gunster, P. Kadkhoda, D. Ristau, “Online spectrophotometric characterisation of MgF2/LaF3-fluoride multilayer coatings production,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ME9-1–ME9-3.

Kagaya, M.

T. Saito, J. Saito, T. Nakamura, T. Kudo, M. Kagaya, T. Takahashi, “Measurement of total integrated scatter of optical coatings for 157nm lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 22–29 (2001).

Kessler, H.

Kiriakidis, G.

S. Gunster, D. Ristau, S. Bosch, A. Duparre, E. Masetti, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “Optical and structural properties for the UV/VUV-spactral range,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB1-1–ThB1-3.

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

Kudo, T.

T. Saito, J. Saito, T. Nakamura, T. Kudo, M. Kagaya, T. Takahashi, “Measurement of total integrated scatter of optical coatings for 157nm lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 22–29 (2001).

Lauth, H.

Liberman, V.

V. Liberman, M. Rothschild, M. N. Efremow, S. T. Palmacci, J. H. C. Sedlacek, C. Van Peski, K. Orvek, “Marathon evaluation of optical materials for 157-nm lithography,” in Optical Microlithography XIV, C. J. Progler, ed., Proc. SPIE4346, 45–51 (2001).

Lindstrom, T.

Mann, K.

O. Apel, K. Mann, “DUV scattering measurements as a tool for characterization of UV-optical surfaces,” Appl. Phys. A 72, 59–65 (2001).
[CrossRef]

Masetti, E.

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

S. Gunster, D. Ristau, S. Bosch, A. Duparre, E. Masetti, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “Optical and structural properties for the UV/VUV-spactral range,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB1-1–ThB1-3.

Matsumoto, A.

C. Ouchi, M. Hasegawa, A. Matsumoto, K. Sone, “Measurement of absorptance of optical coatings for F2 lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 7–12 (2001).

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

Muller, A.

Nakamura, T.

T. Saito, J. Saito, T. Nakamura, T. Kudo, M. Kagaya, T. Takahashi, “Measurement of total integrated scatter of optical coatings for 157nm lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 22–29 (2001).

Niisaka, S.

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

Orvek, K.

V. Liberman, M. Rothschild, M. N. Efremow, S. T. Palmacci, J. H. C. Sedlacek, C. Van Peski, K. Orvek, “Marathon evaluation of optical materials for 157-nm lithography,” in Optical Microlithography XIV, C. J. Progler, ed., Proc. SPIE4346, 45–51 (2001).

Otani, M.

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

Ouchi, C.

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

C. Ouchi, M. Hasegawa, A. Matsumoto, K. Sone, “Measurement of absorptance of optical coatings for F2 lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 7–12 (2001).

Palmacci, S. T.

V. Liberman, M. Rothschild, M. N. Efremow, S. T. Palmacci, J. H. C. Sedlacek, C. Van Peski, K. Orvek, “Marathon evaluation of optical materials for 157-nm lithography,” in Optical Microlithography XIV, C. J. Progler, ed., Proc. SPIE4346, 45–51 (2001).

Peiro, F.

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

S. Gunster, D. Ristau, S. Bosch, A. Duparre, E. Masetti, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “Optical and structural properties for the UV/VUV-spactral range,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB1-1–ThB1-3.

Quesnel, E.

J. Ferre-Borrull, A. Duparre, E. Quesnel, “Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm,” Appl. Opt. 39, 5854–5864 (2000).
[CrossRef]

S. Gunster, D. Ristau, S. Bosch, A. Duparre, E. Masetti, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “Optical and structural properties for the UV/VUV-spactral range,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB1-1–ThB1-3.

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

Reng, N.

Ribbing, C. G.

Ristau, D.

P. Kadkhoda, A. Muller, D. Ristau, A. Duparre, S. Gliech, H. Lauth, U. Schuhmann, N. Reng, M. Tilsch, R. Schuhmann, C. Amra, C. Deumie, C. Jolie, H. Kessler, T. Lindstrom, C. G. Ribbing, J. M. Bennet, “International round-robin experiment to test the International Organization for Standardization total-scattering draft standard,” Appl. Opt. 39, 3321–3332 (2000).
[CrossRef]

S. Gunster, D. Ristau, S. Bosch, A. Duparre, E. Masetti, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “Optical and structural properties for the UV/VUV-spactral range,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB1-1–ThB1-3.

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

S. Gunster, P. Kadkhoda, D. Ristau, “Online spectrophotometric characterisation of MgF2/LaF3-fluoride multilayer coatings production,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ME9-1–ME9-3.

Roche, P.

Rothschild, M.

V. Liberman, M. Rothschild, M. N. Efremow, S. T. Palmacci, J. H. C. Sedlacek, C. Van Peski, K. Orvek, “Marathon evaluation of optical materials for 157-nm lithography,” in Optical Microlithography XIV, C. J. Progler, ed., Proc. SPIE4346, 45–51 (2001).

Saito, J.

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

T. Saito, J. Saito, T. Nakamura, T. Kudo, M. Kagaya, T. Takahashi, “Measurement of total integrated scatter of optical coatings for 157nm lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 22–29 (2001).

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

Saito, T.

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

T. Saito, J. Saito, T. Nakamura, T. Kudo, M. Kagaya, T. Takahashi, “Measurement of total integrated scatter of optical coatings for 157nm lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 22–29 (2001).

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

Schuhmann, R.

Schuhmann, U.

Sedlacek, J. H. C.

V. Liberman, M. Rothschild, M. N. Efremow, S. T. Palmacci, J. H. C. Sedlacek, C. Van Peski, K. Orvek, “Marathon evaluation of optical materials for 157-nm lithography,” in Optical Microlithography XIV, C. J. Progler, ed., Proc. SPIE4346, 45–51 (2001).

Sone, K.

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

C. Ouchi, M. Hasegawa, A. Matsumoto, K. Sone, “Measurement of absorptance of optical coatings for F2 lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 7–12 (2001).

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

Steinert, J.

J. Steinert, S. Gliech, M. Flemming, A. Duparre, “Instrument for light scatter measurements at 157nm and 193nm,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA8–1–ThA8–3.

Suzuki, Y.

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

Takahashi, T.

T. Saito, J. Saito, T. Nakamura, T. Kudo, M. Kagaya, T. Takahashi, “Measurement of total integrated scatter of optical coatings for 157nm lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 22–29 (2001).

Tanaka, A.

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

Tikhonravov, A.

S. Gunster, D. Ristau, S. Bosch, A. Duparre, E. Masetti, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “Optical and structural properties for the UV/VUV-spactral range,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB1-1–ThB1-3.

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

Tilsch, M.

Van Peski, C.

V. Liberman, M. Rothschild, M. N. Efremow, S. T. Palmacci, J. H. C. Sedlacek, C. Van Peski, K. Orvek, “Marathon evaluation of optical materials for 157-nm lithography,” in Optical Microlithography XIV, C. J. Progler, ed., Proc. SPIE4346, 45–51 (2001).

Appl. Opt.

Appl. Phys. A

O. Apel, K. Mann, “DUV scattering measurements as a tool for characterization of UV-optical surfaces,” Appl. Phys. A 72, 59–65 (2001).
[CrossRef]

Other

International Organization for Standardization, “Optics and optical instrument—Test methods for radiation scattered by optical components,” standard ISO/DIS 13696 (International Organization for Standardization, Geneva, 1999).

S. Niisaka, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157nm lithography. I. Coating materials,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB7–1–ThB7–3.

International Organization for Standardization, “Optics and optical instruments—Lasers and laser-related equipment—Test method for absorptance of optical laser components,” 1st ed., standard ISO15511 (International Organization for Standardization, Geneva, 1997).

A. Duparre, “Roughness and scattering of coatings for DUV to EUV spectral regions,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington D.C., 2001), pp. ThA2–1–ThA2–3.

J. Steinert, S. Gliech, M. Flemming, A. Duparre, “Instrument for light scatter measurements at 157nm and 193nm,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA8–1–ThA8–3.

V. Liberman, M. Rothschild, M. N. Efremow, S. T. Palmacci, J. H. C. Sedlacek, C. Van Peski, K. Orvek, “Marathon evaluation of optical materials for 157-nm lithography,” in Optical Microlithography XIV, C. J. Progler, ed., Proc. SPIE4346, 45–51 (2001).

D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “UV-optical and microstructural properties of MgF2-and LaF3-coatings deposited by IBS and PVD processes,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThA5–1–ThA5–3.

S. Gunster, D. Ristau, S. Bosch, A. Duparre, E. Masetti, G. Kiriakidis, F. Peiro, E. Quesnel, A. Tikhonravov, “Optical and structural properties for the UV/VUV-spactral range,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ThB1-1–ThB1-3.

S. Gunster, P. Kadkhoda, D. Ristau, “Online spectrophotometric characterisation of MgF2/LaF3-fluoride multilayer coatings production,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, D.C., 2001), pp. ME9-1–ME9-3.

M. Otani, S. Niisaka, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, T. Saito, J. Saito, A. Tanaka, K. Sone, A. Matsumoto, “Development of optical coatings for 157 nm lithography: II: multilayer coating,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics Series (Optical Society of America, Washington, DC, 2001), pp. ThB8–1–ThB8–3.

C. Ouchi, M. Hasegawa, A. Matsumoto, K. Sone, “Measurement of absorptance of optical coatings for F2 lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 7–12 (2001).

T. Saito, J. Saito, T. Nakamura, T. Kudo, M. Kagaya, T. Takahashi, “Measurement of total integrated scatter of optical coatings for 157nm lithography,” in Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, A. Duparre, B. Singh, G. A. Al-Jumaily, eds., Proc. SPIE4449, 22–29 (2001).

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Figures (12)

Fig. 1
Fig. 1

Schematic diagram of the VUV spectrophotometer.

Fig. 2
Fig. 2

Schematic diagram of the absorption measurement system.

Fig. 3
Fig. 3

Temperature of the sample holder during measurement.

Fig. 4
Fig. 4

Reproducibility of the measurement. The sample is a CaF2 bare substrate.

Fig. 5
Fig. 5

Typical absorptance measurement result for an AR coating. The change in absorptance with irradiated pulses is shown.

Fig. 6
Fig. 6

Schematic diagram of the scatterometer.

Fig. 7
Fig. 7

Photograph of the scatterometer setup.

Fig. 8
Fig. 8

Configuration for the calibration: (a) sample measurement, (b) calibration.

Fig. 9
Fig. 9

Sampling sequence.

Fig. 10
Fig. 10

Typical result of scatter-measurement of an AR coating.

Fig. 11
Fig. 11

AR coating samples for (a) absorption and scatter measurement and (b) reflectance measurement.

Fig. 12
Fig. 12

Spectral reflectances of the AR coatings: (a) vendors A and B; (b) vendors C and D.

Tables (4)

Tables Icon

Table 1 Typical Conditions for Absorption Measurement

Tables Icon

Table 2 Typical Conditions for Scattering Measurement

Tables Icon

Table 3 Coating Designs and Coating Processes of the AR Coating Samples Supplied from Four Vendors

Tables Icon

Table 4 Results of Reflectance, Absorptance, and Scatter Measurement of AR Coating Samples

Equations (4)

Equations on this page are rendered with MathJax. Learn more.

A= micpi/P×|dT/dt|h+|dT/dt|c,
 micpi=W/|dT/dt|hr+|dT/dt|cr,
S=fS1/S2,
f=rS2 standard/S1 standard,

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