Abstract

A coherent multiple imaging technique for use in optical microlithography was studied. The technique involves placing a thin Fabry–Perot etalon between the mask and the projection lens of an optical stepper. An optical lithographic computer simulation tool, Prolith/2, was used to evaluate the aerial image profile obtained for extended mask structures such as typical contact hole arrays and line–space patterns used in integrated circuit fabrication. Additionally, a set of experimental studies were performed to validate the simulation results. Enhancement of both resolution and depth of focus can be obtained simultaneously with appropriate etalon parameters.

© 2000 Optical Society of America

Simulation of coherent multiple imaging by means of pupil-plane filtering in optical microlithography

M. Erdélyi, Zs. Bor, W. L. Wilson, M. C. Smayling, and F. K. Tittel
J. Opt. Soc. Am. A 16(8) 1909-1914 (1999)

Fabry-Perot filters used for optical preprocessing

G. Indebetouw and S. K. Case
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Tunable spatial filtering with a Fabry-Perot etalon

G. Indebetouw
Appl. Opt. 19(5) 761-764 (1980)

A Spatial Spectral Scanning Technique for the Fabry–Perot Spectrometer

G. G. Shepherd, C. W. Lake, J. R. Miller, and L. L. Cogger
Appl. Opt. 4(3) 267-272 (1965)

Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image

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