Abstract

Reflectance measurements and optical constants of thin films of ion-beam-deposited SiC, Mo, Mg2Si, and InSb and of evaporated Cr have been measured in the extreme-ultraviolet (EUV) spectral region from 49.0 to 200.0 nm. In this spectral region no optical constant data were available for materials deposited by ion-beam deposition. We compared our data with those for bulk samples and for thin films prepared by different techniques. The goal of this research has been to study candidate materials for multilayer coatings in the EUV.

© 2000 Optical Society of America

Full Article  |  PDF Article

References

  • View by:
  • |
  • |
  • |

  1. J. I. Larruquert, R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the extreme-ultraviolet spectral range of 50 to 121.6 nm,” Appl. Opt. 38, 1231–1236 (1999).
    [CrossRef]
  2. J. F. Osantowski, “Reflectance and optical constants for Cer-Vit from 250 to 1050 Å,” J. Opt. Soc. Am. 64, 834–838 (1974).
    [CrossRef]
  3. W. J. Choyke, R. F. Farich, R. A. Hoffman, “SiC, a new material for mirrors. 1: High power lasers; 2: VUV applications,” Appl. Opt. 15, 2006–2007 (1976), and references therein.
  4. E. D. Palik, Handbook of Optical Constants of Solids (Academic, San Diego, Calif., 1998).
  5. M. M. Kelly, J. B. West, D. E. Lloyd, “Reflectance of silicon carbide in the vacuum ultraviolet,” J. Phys. D 14, 401–404 (1981).
    [CrossRef]
  6. R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, A. R. Toft, “Normal incidence reflectance of ion beam deposited SiC films in the EUV,” Appl. Opt. 27, 2815–2816 (1988).
    [CrossRef] [PubMed]
  7. R. A. M. Keski-Kuha, C. M. Fleetwood, J. Robichaud, “Performance of high density cast silicon carbide in the extreme ultraviolet,” Appl. Opt. 36, 4409–4410 (1997).
    [CrossRef] [PubMed]
  8. J. B. Kortright, D. L. Windt, “Amorphous silicon carbide coatings for extreme ultraviolet optics,” Appl. Opt. 27, 2841–2846 (1988).
    [CrossRef] [PubMed]
  9. D. Schwarcz, R. A. M. Keski-Kuha, “Degradation in EUV reflectance of ion-sputtered SiC films,” in Beam-Solid Interactions for Materials Synthesis and Characterization, D. C. Jacobson, D. E. Luzzi, T. F. Heinz, M. Iwaki, eds., Mater. Res. Soc. Symp. Proc.354, 535–540 (1995).
    [CrossRef]
  10. D. Schwarcz, R. A. M. Keski-Kuha, “Dual ion beam sputtering of carbides for EUV reflectance,” in Ion–Solid Interactions for Materials Modification and Processing, D. B. Poker, D. Ila, Y. T. Cheng, L. R. Harriott, T. W. Sigmon, eds., Mat. Res. Soc. Symp. Proc.396, 503–508 (1996).
    [CrossRef]
  11. L. J. LeBlanc, J. S. Farrell, D. W. Juenker, “Far-ultraviolet reflectance of several transition metals,” J. Opt. Soc. Am. 54, 956–957 (1964).
    [CrossRef]
  12. D. W. Juenker, L. J. LeBlanc, C. R. Martin, “Optical properties of some transition metals,” J. Opt. Soc. Am. 58, 164–171 (1968).
    [CrossRef]
  13. J. H. Weaver, D. W. Lynch, C. G. Olson, “Optical properties of V, Ta, and Mo from 0.1 to 35 eV,” Phys. Rev. B 10, 501–516 (1974).
    [CrossRef]
  14. E. S. Black, D. W. Lynch, C. G. Olson, “Optical properties (0.1–25 eV) of Nb–Mo and other Nb-based alloys,” Phys. Rev. B 16, 2337–2345 (1977).
    [CrossRef]
  15. M. M. Kirillova, G. A. Bolotin, V. M. Mayevskiy, “Interband transitions in molybdenum,” Phys. Met. Metall. 24, 91–96 (1967).
  16. K. A. Kress, G. J. Lapeyre, “Optical properties of molybdenum and ruthenium,” J. Opt. Soc. Am. 60, 1681–1684 (1970).
    [CrossRef]
  17. J. H. Weaver, C. G. Olson, “Optical absorption in the 4d transition metals from 20 to 250 eV,” Phys. Rev. B 14, 3251–3255 (1976).
    [CrossRef]
  18. R. Manzke, “Optical properties of molybdenum by electron energy loss spectroscopy,” Phys. Status Solidi B 97, 157–160 (1980).
    [CrossRef]
  19. D. L. Windt, W. C. Cash, M. Scott, P. Arendt, B. Newnam, R. F. Fisher, A. B. Swartzlander, “Optical constants for thin films of Ti, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Hf, Ta, W, Re, Ir, Os, Pt, and Au from 24 Å to 1216 Å,” Appl. Opt. 27, 246–278 (1988).
    [CrossRef] [PubMed]
  20. T. W. Barbee, “Multilayer optics for the soft x-ray and extreme ultraviolet,” Mater. Res. Bull. 15(2), 37–44 (1990).
  21. P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
    [CrossRef]
  22. P. Houdy, M. Kühne, P. Müller, R. Barchewitz, J. P. Delaboudiniere, D. J. Smith, “Tungsten/magnesium silicide multilayers for soft x ray optics,” J. X-Ray Sci. Technol. 3, 118–132 (1992).
    [CrossRef]
  23. E. Spiller, Soft X-Ray Optics (SPIE, Bellingham, Wash., 1994), p. 184.
  24. M. Cardona, W. Gudat, B. Sonntag, P. Y. Yu, “Optical absorption of semiconductors from 12 to 200 eV,” in Proceedings of the Tenth International Conference on the Physics of Semiconductors (U.S. Atomic Energy Commission, Oak Ridge, Tenn., 1970), pp. 209–212.
  25. H. R. Philipp, H. Ehrenreich, “Optical properties of semiconductors,” Phys. Rev. 129, 1550–1560 (1963).
    [CrossRef]
  26. P. Girault, A. Seignac, M. Priol, S. Robin, “Propriétés optiques du chrome et du plomb dans l’ultraviolet lointain,” C. R. Acad. Sci. 266B, 688–690 (1968).
  27. Yu P. Udoev, “Optical spectra of metals of the chromium subgroup,” Opt. Spectrosc. (USSR) 33, 185–186 (1972).
  28. C. Wehenkel, B. Gauthé, “Electron energy loss spectra and optical constants for the first transition series from 2 to 120 eV,” Phys. Status Solidi B 64, 515–525 (1974).
    [CrossRef]
  29. C. Wehenkel, B. Gauthé, “Optical absorption coefficient of the first series transition metals between 20 and 130 eV,” Phys. Lett. 47a, 253–254 (1974).
    [CrossRef]
  30. J. H. Weaver, C. Krafka, D. W. Lynch, E. E. Koch, in Physik Daten—Optical Properties of Metals, H. Behrens, G. Ebel, eds. (Fachinformationszentrum, Karlsruhe, Germany, 1981), Vol. 18-1.

1999 (1)

1997 (1)

1992 (1)

P. Houdy, M. Kühne, P. Müller, R. Barchewitz, J. P. Delaboudiniere, D. J. Smith, “Tungsten/magnesium silicide multilayers for soft x ray optics,” J. X-Ray Sci. Technol. 3, 118–132 (1992).
[CrossRef]

1990 (1)

T. W. Barbee, “Multilayer optics for the soft x-ray and extreme ultraviolet,” Mater. Res. Bull. 15(2), 37–44 (1990).

1988 (3)

1981 (1)

M. M. Kelly, J. B. West, D. E. Lloyd, “Reflectance of silicon carbide in the vacuum ultraviolet,” J. Phys. D 14, 401–404 (1981).
[CrossRef]

1980 (1)

R. Manzke, “Optical properties of molybdenum by electron energy loss spectroscopy,” Phys. Status Solidi B 97, 157–160 (1980).
[CrossRef]

1977 (1)

E. S. Black, D. W. Lynch, C. G. Olson, “Optical properties (0.1–25 eV) of Nb–Mo and other Nb-based alloys,” Phys. Rev. B 16, 2337–2345 (1977).
[CrossRef]

1976 (2)

J. H. Weaver, C. G. Olson, “Optical absorption in the 4d transition metals from 20 to 250 eV,” Phys. Rev. B 14, 3251–3255 (1976).
[CrossRef]

W. J. Choyke, R. F. Farich, R. A. Hoffman, “SiC, a new material for mirrors. 1: High power lasers; 2: VUV applications,” Appl. Opt. 15, 2006–2007 (1976), and references therein.

1974 (4)

J. F. Osantowski, “Reflectance and optical constants for Cer-Vit from 250 to 1050 Å,” J. Opt. Soc. Am. 64, 834–838 (1974).
[CrossRef]

C. Wehenkel, B. Gauthé, “Electron energy loss spectra and optical constants for the first transition series from 2 to 120 eV,” Phys. Status Solidi B 64, 515–525 (1974).
[CrossRef]

C. Wehenkel, B. Gauthé, “Optical absorption coefficient of the first series transition metals between 20 and 130 eV,” Phys. Lett. 47a, 253–254 (1974).
[CrossRef]

J. H. Weaver, D. W. Lynch, C. G. Olson, “Optical properties of V, Ta, and Mo from 0.1 to 35 eV,” Phys. Rev. B 10, 501–516 (1974).
[CrossRef]

1972 (1)

Yu P. Udoev, “Optical spectra of metals of the chromium subgroup,” Opt. Spectrosc. (USSR) 33, 185–186 (1972).

1970 (1)

1968 (2)

D. W. Juenker, L. J. LeBlanc, C. R. Martin, “Optical properties of some transition metals,” J. Opt. Soc. Am. 58, 164–171 (1968).
[CrossRef]

P. Girault, A. Seignac, M. Priol, S. Robin, “Propriétés optiques du chrome et du plomb dans l’ultraviolet lointain,” C. R. Acad. Sci. 266B, 688–690 (1968).

1967 (1)

M. M. Kirillova, G. A. Bolotin, V. M. Mayevskiy, “Interband transitions in molybdenum,” Phys. Met. Metall. 24, 91–96 (1967).

1964 (1)

1963 (1)

H. R. Philipp, H. Ehrenreich, “Optical properties of semiconductors,” Phys. Rev. 129, 1550–1560 (1963).
[CrossRef]

Arendt, P.

Barbee, T. W.

T. W. Barbee, “Multilayer optics for the soft x-ray and extreme ultraviolet,” Mater. Res. Bull. 15(2), 37–44 (1990).

Barchewitz, R.

P. Houdy, M. Kühne, P. Müller, R. Barchewitz, J. P. Delaboudiniere, D. J. Smith, “Tungsten/magnesium silicide multilayers for soft x ray optics,” J. X-Ray Sci. Technol. 3, 118–132 (1992).
[CrossRef]

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Black, E. S.

E. S. Black, D. W. Lynch, C. G. Olson, “Optical properties (0.1–25 eV) of Nb–Mo and other Nb-based alloys,” Phys. Rev. B 16, 2337–2345 (1977).
[CrossRef]

Boher, P.

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Bolotin, G. A.

M. M. Kirillova, G. A. Bolotin, V. M. Mayevskiy, “Interband transitions in molybdenum,” Phys. Met. Metall. 24, 91–96 (1967).

Cardona, M.

M. Cardona, W. Gudat, B. Sonntag, P. Y. Yu, “Optical absorption of semiconductors from 12 to 200 eV,” in Proceedings of the Tenth International Conference on the Physics of Semiconductors (U.S. Atomic Energy Commission, Oak Ridge, Tenn., 1970), pp. 209–212.

Cash, W. C.

Choyke, W. J.

Delaboudiniere, J. P.

P. Houdy, M. Kühne, P. Müller, R. Barchewitz, J. P. Delaboudiniere, D. J. Smith, “Tungsten/magnesium silicide multilayers for soft x ray optics,” J. X-Ray Sci. Technol. 3, 118–132 (1992).
[CrossRef]

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Ehrenreich, H.

H. R. Philipp, H. Ehrenreich, “Optical properties of semiconductors,” Phys. Rev. 129, 1550–1560 (1963).
[CrossRef]

Farich, R. F.

Farrell, J. S.

Fisher, R. F.

Fleetwood, C. M.

Gauthé, B.

C. Wehenkel, B. Gauthé, “Electron energy loss spectra and optical constants for the first transition series from 2 to 120 eV,” Phys. Status Solidi B 64, 515–525 (1974).
[CrossRef]

C. Wehenkel, B. Gauthé, “Optical absorption coefficient of the first series transition metals between 20 and 130 eV,” Phys. Lett. 47a, 253–254 (1974).
[CrossRef]

Girault, P.

P. Girault, A. Seignac, M. Priol, S. Robin, “Propriétés optiques du chrome et du plomb dans l’ultraviolet lointain,” C. R. Acad. Sci. 266B, 688–690 (1968).

Gudat, W.

M. Cardona, W. Gudat, B. Sonntag, P. Y. Yu, “Optical absorption of semiconductors from 12 to 200 eV,” in Proceedings of the Tenth International Conference on the Physics of Semiconductors (U.S. Atomic Energy Commission, Oak Ridge, Tenn., 1970), pp. 209–212.

Gum, J. S.

Hennet, L.

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Herzig, H.

Hoffman, R. A.

Houdy, P.

P. Houdy, M. Kühne, P. Müller, R. Barchewitz, J. P. Delaboudiniere, D. J. Smith, “Tungsten/magnesium silicide multilayers for soft x ray optics,” J. X-Ray Sci. Technol. 3, 118–132 (1992).
[CrossRef]

Houdy, Ph.

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Idir, M.

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Juenker, D. W.

Kelly, M. M.

M. M. Kelly, J. B. West, D. E. Lloyd, “Reflectance of silicon carbide in the vacuum ultraviolet,” J. Phys. D 14, 401–404 (1981).
[CrossRef]

Keski-Kuha, R. A. M.

J. I. Larruquert, R. A. M. Keski-Kuha, “Multilayer coatings with high reflectance in the extreme-ultraviolet spectral range of 50 to 121.6 nm,” Appl. Opt. 38, 1231–1236 (1999).
[CrossRef]

R. A. M. Keski-Kuha, C. M. Fleetwood, J. Robichaud, “Performance of high density cast silicon carbide in the extreme ultraviolet,” Appl. Opt. 36, 4409–4410 (1997).
[CrossRef] [PubMed]

R. A. M. Keski-Kuha, J. F. Osantowski, H. Herzig, J. S. Gum, A. R. Toft, “Normal incidence reflectance of ion beam deposited SiC films in the EUV,” Appl. Opt. 27, 2815–2816 (1988).
[CrossRef] [PubMed]

D. Schwarcz, R. A. M. Keski-Kuha, “Dual ion beam sputtering of carbides for EUV reflectance,” in Ion–Solid Interactions for Materials Modification and Processing, D. B. Poker, D. Ila, Y. T. Cheng, L. R. Harriott, T. W. Sigmon, eds., Mat. Res. Soc. Symp. Proc.396, 503–508 (1996).
[CrossRef]

D. Schwarcz, R. A. M. Keski-Kuha, “Degradation in EUV reflectance of ion-sputtered SiC films,” in Beam-Solid Interactions for Materials Synthesis and Characterization, D. C. Jacobson, D. E. Luzzi, T. F. Heinz, M. Iwaki, eds., Mater. Res. Soc. Symp. Proc.354, 535–540 (1995).
[CrossRef]

Kirillova, M. M.

M. M. Kirillova, G. A. Bolotin, V. M. Mayevskiy, “Interband transitions in molybdenum,” Phys. Met. Metall. 24, 91–96 (1967).

Koch, E. E.

J. H. Weaver, C. Krafka, D. W. Lynch, E. E. Koch, in Physik Daten—Optical Properties of Metals, H. Behrens, G. Ebel, eds. (Fachinformationszentrum, Karlsruhe, Germany, 1981), Vol. 18-1.

Kortright, J. B.

Krafka, C.

J. H. Weaver, C. Krafka, D. W. Lynch, E. E. Koch, in Physik Daten—Optical Properties of Metals, H. Behrens, G. Ebel, eds. (Fachinformationszentrum, Karlsruhe, Germany, 1981), Vol. 18-1.

Kress, K. A.

Kühne, M.

P. Houdy, M. Kühne, P. Müller, R. Barchewitz, J. P. Delaboudiniere, D. J. Smith, “Tungsten/magnesium silicide multilayers for soft x ray optics,” J. X-Ray Sci. Technol. 3, 118–132 (1992).
[CrossRef]

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Lapeyre, G. J.

Larruquert, J. I.

LeBlanc, L. J.

Li, Z. G.

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Lloyd, D. E.

M. M. Kelly, J. B. West, D. E. Lloyd, “Reflectance of silicon carbide in the vacuum ultraviolet,” J. Phys. D 14, 401–404 (1981).
[CrossRef]

Lynch, D. W.

E. S. Black, D. W. Lynch, C. G. Olson, “Optical properties (0.1–25 eV) of Nb–Mo and other Nb-based alloys,” Phys. Rev. B 16, 2337–2345 (1977).
[CrossRef]

J. H. Weaver, D. W. Lynch, C. G. Olson, “Optical properties of V, Ta, and Mo from 0.1 to 35 eV,” Phys. Rev. B 10, 501–516 (1974).
[CrossRef]

J. H. Weaver, C. Krafka, D. W. Lynch, E. E. Koch, in Physik Daten—Optical Properties of Metals, H. Behrens, G. Ebel, eds. (Fachinformationszentrum, Karlsruhe, Germany, 1981), Vol. 18-1.

Manzke, R.

R. Manzke, “Optical properties of molybdenum by electron energy loss spectroscopy,” Phys. Status Solidi B 97, 157–160 (1980).
[CrossRef]

Martin, C. R.

Mayevskiy, V. M.

M. M. Kirillova, G. A. Bolotin, V. M. Mayevskiy, “Interband transitions in molybdenum,” Phys. Met. Metall. 24, 91–96 (1967).

Modak, A.

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Moreno, T.

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Müller, P.

P. Houdy, M. Kühne, P. Müller, R. Barchewitz, J. P. Delaboudiniere, D. J. Smith, “Tungsten/magnesium silicide multilayers for soft x ray optics,” J. X-Ray Sci. Technol. 3, 118–132 (1992).
[CrossRef]

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Newnam, B.

Olson, C. G.

E. S. Black, D. W. Lynch, C. G. Olson, “Optical properties (0.1–25 eV) of Nb–Mo and other Nb-based alloys,” Phys. Rev. B 16, 2337–2345 (1977).
[CrossRef]

J. H. Weaver, C. G. Olson, “Optical absorption in the 4d transition metals from 20 to 250 eV,” Phys. Rev. B 14, 3251–3255 (1976).
[CrossRef]

J. H. Weaver, D. W. Lynch, C. G. Olson, “Optical properties of V, Ta, and Mo from 0.1 to 35 eV,” Phys. Rev. B 10, 501–516 (1974).
[CrossRef]

Osantowski, J. F.

Palik, E. D.

E. D. Palik, Handbook of Optical Constants of Solids (Academic, San Diego, Calif., 1998).

Philipp, H. R.

H. R. Philipp, H. Ehrenreich, “Optical properties of semiconductors,” Phys. Rev. 129, 1550–1560 (1963).
[CrossRef]

Priol, M.

P. Girault, A. Seignac, M. Priol, S. Robin, “Propriétés optiques du chrome et du plomb dans l’ultraviolet lointain,” C. R. Acad. Sci. 266B, 688–690 (1968).

Robichaud, J.

Robin, S.

P. Girault, A. Seignac, M. Priol, S. Robin, “Propriétés optiques du chrome et du plomb dans l’ultraviolet lointain,” C. R. Acad. Sci. 266B, 688–690 (1968).

Schwarcz, D.

D. Schwarcz, R. A. M. Keski-Kuha, “Degradation in EUV reflectance of ion-sputtered SiC films,” in Beam-Solid Interactions for Materials Synthesis and Characterization, D. C. Jacobson, D. E. Luzzi, T. F. Heinz, M. Iwaki, eds., Mater. Res. Soc. Symp. Proc.354, 535–540 (1995).
[CrossRef]

D. Schwarcz, R. A. M. Keski-Kuha, “Dual ion beam sputtering of carbides for EUV reflectance,” in Ion–Solid Interactions for Materials Modification and Processing, D. B. Poker, D. Ila, Y. T. Cheng, L. R. Harriott, T. W. Sigmon, eds., Mat. Res. Soc. Symp. Proc.396, 503–508 (1996).
[CrossRef]

Scott, M.

Seignac, A.

P. Girault, A. Seignac, M. Priol, S. Robin, “Propriétés optiques du chrome et du plomb dans l’ultraviolet lointain,” C. R. Acad. Sci. 266B, 688–690 (1968).

Smith, D. J.

P. Houdy, M. Kühne, P. Müller, R. Barchewitz, J. P. Delaboudiniere, D. J. Smith, “Tungsten/magnesium silicide multilayers for soft x ray optics,” J. X-Ray Sci. Technol. 3, 118–132 (1992).
[CrossRef]

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

Sonntag, B.

M. Cardona, W. Gudat, B. Sonntag, P. Y. Yu, “Optical absorption of semiconductors from 12 to 200 eV,” in Proceedings of the Tenth International Conference on the Physics of Semiconductors (U.S. Atomic Energy Commission, Oak Ridge, Tenn., 1970), pp. 209–212.

Spiller, E.

E. Spiller, Soft X-Ray Optics (SPIE, Bellingham, Wash., 1994), p. 184.

Swartzlander, A. B.

Toft, A. R.

Udoev, Yu P.

Yu P. Udoev, “Optical spectra of metals of the chromium subgroup,” Opt. Spectrosc. (USSR) 33, 185–186 (1972).

Weaver, J. H.

J. H. Weaver, C. G. Olson, “Optical absorption in the 4d transition metals from 20 to 250 eV,” Phys. Rev. B 14, 3251–3255 (1976).
[CrossRef]

J. H. Weaver, D. W. Lynch, C. G. Olson, “Optical properties of V, Ta, and Mo from 0.1 to 35 eV,” Phys. Rev. B 10, 501–516 (1974).
[CrossRef]

J. H. Weaver, C. Krafka, D. W. Lynch, E. E. Koch, in Physik Daten—Optical Properties of Metals, H. Behrens, G. Ebel, eds. (Fachinformationszentrum, Karlsruhe, Germany, 1981), Vol. 18-1.

Wehenkel, C.

C. Wehenkel, B. Gauthé, “Optical absorption coefficient of the first series transition metals between 20 and 130 eV,” Phys. Lett. 47a, 253–254 (1974).
[CrossRef]

C. Wehenkel, B. Gauthé, “Electron energy loss spectra and optical constants for the first transition series from 2 to 120 eV,” Phys. Status Solidi B 64, 515–525 (1974).
[CrossRef]

West, J. B.

M. M. Kelly, J. B. West, D. E. Lloyd, “Reflectance of silicon carbide in the vacuum ultraviolet,” J. Phys. D 14, 401–404 (1981).
[CrossRef]

Windt, D. L.

Yu, P. Y.

M. Cardona, W. Gudat, B. Sonntag, P. Y. Yu, “Optical absorption of semiconductors from 12 to 200 eV,” in Proceedings of the Tenth International Conference on the Physics of Semiconductors (U.S. Atomic Energy Commission, Oak Ridge, Tenn., 1970), pp. 209–212.

Appl. Opt. (6)

C. R. Acad. Sci. (1)

P. Girault, A. Seignac, M. Priol, S. Robin, “Propriétés optiques du chrome et du plomb dans l’ultraviolet lointain,” C. R. Acad. Sci. 266B, 688–690 (1968).

J. Opt. Soc. Am. (4)

J. Phys. D (1)

M. M. Kelly, J. B. West, D. E. Lloyd, “Reflectance of silicon carbide in the vacuum ultraviolet,” J. Phys. D 14, 401–404 (1981).
[CrossRef]

J. X-Ray Sci. Technol. (1)

P. Houdy, M. Kühne, P. Müller, R. Barchewitz, J. P. Delaboudiniere, D. J. Smith, “Tungsten/magnesium silicide multilayers for soft x ray optics,” J. X-Ray Sci. Technol. 3, 118–132 (1992).
[CrossRef]

Mater. Res. Bull. (1)

T. W. Barbee, “Multilayer optics for the soft x-ray and extreme ultraviolet,” Mater. Res. Bull. 15(2), 37–44 (1990).

Opt. Spectrosc. (USSR) (1)

Yu P. Udoev, “Optical spectra of metals of the chromium subgroup,” Opt. Spectrosc. (USSR) 33, 185–186 (1972).

Phys. Lett. (1)

C. Wehenkel, B. Gauthé, “Optical absorption coefficient of the first series transition metals between 20 and 130 eV,” Phys. Lett. 47a, 253–254 (1974).
[CrossRef]

Phys. Met. Metall. (1)

M. M. Kirillova, G. A. Bolotin, V. M. Mayevskiy, “Interband transitions in molybdenum,” Phys. Met. Metall. 24, 91–96 (1967).

Phys. Rev. (1)

H. R. Philipp, H. Ehrenreich, “Optical properties of semiconductors,” Phys. Rev. 129, 1550–1560 (1963).
[CrossRef]

Phys. Rev. B (3)

J. H. Weaver, C. G. Olson, “Optical absorption in the 4d transition metals from 20 to 250 eV,” Phys. Rev. B 14, 3251–3255 (1976).
[CrossRef]

J. H. Weaver, D. W. Lynch, C. G. Olson, “Optical properties of V, Ta, and Mo from 0.1 to 35 eV,” Phys. Rev. B 10, 501–516 (1974).
[CrossRef]

E. S. Black, D. W. Lynch, C. G. Olson, “Optical properties (0.1–25 eV) of Nb–Mo and other Nb-based alloys,” Phys. Rev. B 16, 2337–2345 (1977).
[CrossRef]

Phys. Status Solidi B (2)

R. Manzke, “Optical properties of molybdenum by electron energy loss spectroscopy,” Phys. Status Solidi B 97, 157–160 (1980).
[CrossRef]

C. Wehenkel, B. Gauthé, “Electron energy loss spectra and optical constants for the first transition series from 2 to 120 eV,” Phys. Status Solidi B 64, 515–525 (1974).
[CrossRef]

Other (7)

J. H. Weaver, C. Krafka, D. W. Lynch, E. E. Koch, in Physik Daten—Optical Properties of Metals, H. Behrens, G. Ebel, eds. (Fachinformationszentrum, Karlsruhe, Germany, 1981), Vol. 18-1.

E. D. Palik, Handbook of Optical Constants of Solids (Academic, San Diego, Calif., 1998).

E. Spiller, Soft X-Ray Optics (SPIE, Bellingham, Wash., 1994), p. 184.

M. Cardona, W. Gudat, B. Sonntag, P. Y. Yu, “Optical absorption of semiconductors from 12 to 200 eV,” in Proceedings of the Tenth International Conference on the Physics of Semiconductors (U.S. Atomic Energy Commission, Oak Ridge, Tenn., 1970), pp. 209–212.

P. Boher, Ph. Houdy, L. Hennet, Z. G. Li, A. Modak, D. J. Smith, M. Idir, T. Moreno, R. Barchewitz, M. Kühne, P. Müller, J. P. Delaboudiniere, “Magnesium silicide based multilayers for soft x-rays optics,” in Multilayer and Grazing Incidence X-Ray/EUV Optics, R. B. Hoover, ed., Proc. SPIE1546, 502–519 (1991).
[CrossRef]

D. Schwarcz, R. A. M. Keski-Kuha, “Degradation in EUV reflectance of ion-sputtered SiC films,” in Beam-Solid Interactions for Materials Synthesis and Characterization, D. C. Jacobson, D. E. Luzzi, T. F. Heinz, M. Iwaki, eds., Mater. Res. Soc. Symp. Proc.354, 535–540 (1995).
[CrossRef]

D. Schwarcz, R. A. M. Keski-Kuha, “Dual ion beam sputtering of carbides for EUV reflectance,” in Ion–Solid Interactions for Materials Modification and Processing, D. B. Poker, D. Ila, Y. T. Cheng, L. R. Harriott, T. W. Sigmon, eds., Mat. Res. Soc. Symp. Proc.396, 503–508 (1996).
[CrossRef]

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (10)

Fig. 1
Fig. 1

Near-normal-incidence reflectance of IBD SiC films compared with data of Ref. 8 for magnetron-sputtered SiC films and of Ref. 6 for CVD SiC.

Fig. 2
Fig. 2

(a) Refractive index and (b) extinction coefficient of IBD SiC films compared with data of Ref. 8 for magnetron-sputtered SiC films and of Ref. 4 for 6H SiC crystals.

Fig. 3
Fig. 3

Near-normal-incidence reflectance of IBD Mo films compared with data of Kress and Lapeyre,16 Windt et al.,19 Weaver et al.,13 Juenker et al.,12 LeBlanc et al.,11 and Black et al.14

Fig. 4
Fig. 4

(a) Refractive index and (b) extinction coefficient of IBD Mo films compared with data of Ref. 13 for Mo crystals.

Fig. 5
Fig. 5

Near-normal-incidence reflectance of IBD Mg2Si films.

Fig. 6
Fig. 6

Refractive index and extinction coefficient of IBD Mg2Si films.

Fig. 7
Fig. 7

Near-normal-incidence reflectance of IBD InSb films compared with data of Philipp and Ehrenreich25 for bulk samples and with calculated reflectance for a thick film with the InSb optical constants determined in this paper.

Fig. 8
Fig. 8

(a) Refractive index and (b) extinction coefficient of IBD InSb films compared with data of Ref. 24 for evaporated films and of Ref. 25 for bulk samples.

Fig. 9
Fig. 9

Near-normal-incidence reflectance of Cr films deposited by evaporation compared with data of Girault et al.,26 Olson and Lynch (as published in Ref. 30), and Udoev.27

Fig. 10
Fig. 10

(a) Refractive index and (b) extinction coefficient of Cr films deposited by evaporation compared with data of Girault et al.26 for films prepared by evaporation and with data of Olson and Lynch30 for bulk samples.

Tables (6)

Tables Icon

Table 1 Optical Constants of IBD SiC

Tables Icon

Table 2 Optical Constants of IBD Mo

Tables Icon

Table 3 Optical Constants of IBD Mg2Si

Tables Icon

Table 4 Reflectance of Fresh Mg2Si Sample and of Sample Stored in a Desiccator

Tables Icon

Table 5 Optical Constants of IBD InSb

Tables Icon

Table 6 Optical Constants of Cr Films Deposited by Evaporation

Equations (6)

Equations on this page are rendered with MathJax. Learn more.

rs,p=r12s,p+r23s,p exp-2iβ1+r12s,pr23s,p exp-2iβ,
β=k0xn22-n12 sin2 θ1/2,
p=Ip-IsIp+Is,
R=1+p2 Rp+1-p2 Rs,
r*12s,p=r12s,p exp-22πσ cos θλ2.
sj2=i=1,  ,mRθiexp-Rθi, nj, kj, p2,

Metrics