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Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam–sensitive glass

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Abstract

For an integrated free-space optical interconnection system we suggest the use of microprisms to achieve large coupling angles at low loss. Prisms were fabricated in photoresist and quartz glass by analog lithography. High-energy-beam–sensitive glass was used as the gray-tone mask. Optical testing of the prisms shows acceptable surface quality and high efficiency (95%).

© 1999 Optical Society of America

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