The influence of mask-alignment errors on the fabrication of
four-level binary lenses has been investigated. The pupil function
was derived as a function of the amount of misalignment between the two
mask patterns based on scalar diffraction theory. It was found that
the phase term in the pupil function affects only the location of the
point-spread function, whereas the uneven light transmittance degrades
the image quality in the direction of the misalignment. The Strehl
intensity was found to decrease almost linearly with respect to the
amount of error.
© 1998 Optical Society of America
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