Abstract

We have developed fluoride antireflection (AR) coatings on MgF2 substrates for a wavelength of 248 nm by molecular-beam deposition. Transmission and laser-induced damage threshold of the samples were measured and atomic force microscope (AFM) investigations were carried out. We compare a 14-layer design for AR coatings with sublayer thicknesses of 12 nm with a conventional two-layer design with quarter-wavelength thicknesses. The laser-induced damage threshold of the 14-layer coating is slightly higher than that of the two-layer coating. The AFM surface images show that the 14-layer coating has a smoother surface than the two-layer coating.

© 1996 Optical Society of America

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  1. F. Rainer, W. H. Lowdermilk, D. Milam, C. K. Carniglia, T. T. Hart, T. L. Lichtenstein, “Materials for optical coatings in the ultraviolet,” Appl. Opt. 24, 496– 500 (1985).
    [CrossRef] [PubMed]
  2. J. Kolbe, H. Mueller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” Natl. Stand. Technol. Spec. Publ. 801, p. 404 (1990).
  3. D. J. Krajnovich, M. Kulkarni, W. Leung, A. C. Tam, A. Spool, B. York, “Testing of the durability of single-crystal calcium fluoride with and without antireflection coatings for use with high-power KrF excimer lasers,” Appl. Opt. 31, 6062–6075 (1992).
    [CrossRef] [PubMed]
  4. N. Kaiser, “Resistance of coated optics to UV laser irradiation,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE2253, 722 (1994).
  5. K. Mann, E. Eva, A. Hopfmueller, “Damage testing and characterization of dielectric coatings for high power excimer lasers,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE2253, 731 (1994).
  6. N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).
  7. N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, K. Mann, E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995).
    [CrossRef]
  8. T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. E. Bennett, L. L. Chase, A. H. Guenther, B. Newnam, M. Soileau, eds., Proc. SPIE1441, 339 (1990).
  9. I. M. Thomas, “Porous fluoride antireflective coatings,” Appl. Opt. 27, 3356–3358 (1988).
    [CrossRef] [PubMed]
  10. K. L. Lewis, J. A. Savage, “A fundamental approach towards improved optical coatings,” Natl. Bur. Stand. (U.S.) Spec. Publ. 688, 277–286 (1985).
  11. K. L. Lewis, I. T. Muirhead, A. M. Pitt, A. G. Gullis, N. G. Chew, A. Miller, T. J. Wyatt-Davies, “Molecular beam deposition of optical coatings and their characterization,” App. Opt. 28, 2785–2791 (1989).
    [CrossRef]
  12. I. T. Muirhead, C. C. Hale, S. P. Fisher, G. J. H. Mathew, “Interference filters from molecular beam deposition,” in Optical Thin Films and Applications, R. Herrmann, ed., Proc. SPIE1270, 184 (1990).
  13. S. Laux, W. Richter, “Packing density calculation of thin fluoride films from infrared transmission spectra,” Appl. Opt. 35, 97–101 (1996).
    [CrossRef] [PubMed]
  14. K. Mann, H. Gerhardt, “Set-up of a damage testing facility for excimer laser radiation,” in Excimer Lasers and Applications, D. Basting, ed., Proc. SPIE1023, 136 (1989).
  15. K. Mann, H. Gerhardt, “Automated damage testing facility for excimer laser optics,” Natl. Inst. Stand. Technol. Spec. Publ. 801, p. 39 (1990).
  16. U. Kaiser, N. Kaiser, P. Weissbrodt, U. Mademann, E. Hacker, H. Mueller, “Structure of thin fluoride films deposited on amorphous substrates,” Thin Solid Films 217, 7–16 (1992).
    [CrossRef]
  17. U. Kaiser, N. Kaiser, P. Weiβbrodt, D. Mademann, E. Hacker, “Initial layer growth in thin MgF2-, LaF2-, CaF2-, and LiF-films,” Le vide le Coches Mines Suppl. 259, 104–106 (1991).
  18. U. Kaiser, M. Adamik, G. Sáfrén, P. B. Barnd, S. Laux, W. Richter, “Growth structure investigations of MgF2 and NdF3 MBD films on CaF2 (111) substrates,” Thin Solid Films 280, 5–15 (1996).
    [CrossRef]

1996 (2)

U. Kaiser, M. Adamik, G. Sáfrén, P. B. Barnd, S. Laux, W. Richter, “Growth structure investigations of MgF2 and NdF3 MBD films on CaF2 (111) substrates,” Thin Solid Films 280, 5–15 (1996).
[CrossRef]

S. Laux, W. Richter, “Packing density calculation of thin fluoride films from infrared transmission spectra,” Appl. Opt. 35, 97–101 (1996).
[CrossRef] [PubMed]

1995 (1)

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, K. Mann, E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995).
[CrossRef]

1992 (2)

1991 (1)

U. Kaiser, N. Kaiser, P. Weiβbrodt, D. Mademann, E. Hacker, “Initial layer growth in thin MgF2-, LaF2-, CaF2-, and LiF-films,” Le vide le Coches Mines Suppl. 259, 104–106 (1991).

1990 (2)

K. Mann, H. Gerhardt, “Automated damage testing facility for excimer laser optics,” Natl. Inst. Stand. Technol. Spec. Publ. 801, p. 39 (1990).

J. Kolbe, H. Mueller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” Natl. Stand. Technol. Spec. Publ. 801, p. 404 (1990).

1989 (1)

K. L. Lewis, I. T. Muirhead, A. M. Pitt, A. G. Gullis, N. G. Chew, A. Miller, T. J. Wyatt-Davies, “Molecular beam deposition of optical coatings and their characterization,” App. Opt. 28, 2785–2791 (1989).
[CrossRef]

1988 (1)

1985 (2)

F. Rainer, W. H. Lowdermilk, D. Milam, C. K. Carniglia, T. T. Hart, T. L. Lichtenstein, “Materials for optical coatings in the ultraviolet,” Appl. Opt. 24, 496– 500 (1985).
[CrossRef] [PubMed]

K. L. Lewis, J. A. Savage, “A fundamental approach towards improved optical coatings,” Natl. Bur. Stand. (U.S.) Spec. Publ. 688, 277–286 (1985).

Adamik, M.

U. Kaiser, M. Adamik, G. Sáfrén, P. B. Barnd, S. Laux, W. Richter, “Growth structure investigations of MgF2 and NdF3 MBD films on CaF2 (111) substrates,” Thin Solid Films 280, 5–15 (1996).
[CrossRef]

Anton, B.

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, K. Mann, E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995).
[CrossRef]

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Barnd, P. B.

U. Kaiser, M. Adamik, G. Sáfrén, P. B. Barnd, S. Laux, W. Richter, “Growth structure investigations of MgF2 and NdF3 MBD films on CaF2 (111) substrates,” Thin Solid Films 280, 5–15 (1996).
[CrossRef]

Carniglia, C. K.

Chew, N. G.

K. L. Lewis, I. T. Muirhead, A. M. Pitt, A. G. Gullis, N. G. Chew, A. Miller, T. J. Wyatt-Davies, “Molecular beam deposition of optical coatings and their characterization,” App. Opt. 28, 2785–2791 (1989).
[CrossRef]

Ebert, J.

J. Kolbe, H. Mueller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” Natl. Stand. Technol. Spec. Publ. 801, p. 404 (1990).

Eva, E.

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, K. Mann, E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995).
[CrossRef]

K. Mann, E. Eva, A. Hopfmueller, “Damage testing and characterization of dielectric coatings for high power excimer lasers,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE2253, 731 (1994).

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Fischer, C.

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Fisher, S. P.

I. T. Muirhead, C. C. Hale, S. P. Fisher, G. J. H. Mathew, “Interference filters from molecular beam deposition,” in Optical Thin Films and Applications, R. Herrmann, ed., Proc. SPIE1270, 184 (1990).

Gerhardt, H.

K. Mann, H. Gerhardt, “Automated damage testing facility for excimer laser optics,” Natl. Inst. Stand. Technol. Spec. Publ. 801, p. 39 (1990).

K. Mann, H. Gerhardt, “Set-up of a damage testing facility for excimer laser radiation,” in Excimer Lasers and Applications, D. Basting, ed., Proc. SPIE1023, 136 (1989).

Gullis, A. G.

K. L. Lewis, I. T. Muirhead, A. M. Pitt, A. G. Gullis, N. G. Chew, A. Miller, T. J. Wyatt-Davies, “Molecular beam deposition of optical coatings and their characterization,” App. Opt. 28, 2785–2791 (1989).
[CrossRef]

Hacker, E.

U. Kaiser, N. Kaiser, P. Weissbrodt, U. Mademann, E. Hacker, H. Mueller, “Structure of thin fluoride films deposited on amorphous substrates,” Thin Solid Films 217, 7–16 (1992).
[CrossRef]

U. Kaiser, N. Kaiser, P. Weiβbrodt, D. Mademann, E. Hacker, “Initial layer growth in thin MgF2-, LaF2-, CaF2-, and LiF-films,” Le vide le Coches Mines Suppl. 259, 104–106 (1991).

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Hale, C. C.

I. T. Muirhead, C. C. Hale, S. P. Fisher, G. J. H. Mathew, “Interference filters from molecular beam deposition,” in Optical Thin Films and Applications, R. Herrmann, ed., Proc. SPIE1270, 184 (1990).

Hart, T. T.

Hashimoto, I.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. E. Bennett, L. L. Chase, A. H. Guenther, B. Newnam, M. Soileau, eds., Proc. SPIE1441, 339 (1990).

Henking, R.

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Hopfmueller, A.

K. Mann, E. Eva, A. Hopfmueller, “Damage testing and characterization of dielectric coatings for high power excimer lasers,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE2253, 731 (1994).

Izawa, T.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. E. Bennett, L. L. Chase, A. H. Guenther, B. Newnam, M. Soileau, eds., Proc. SPIE1441, 339 (1990).

Jaenchen, H.

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Kaiser, N.

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, K. Mann, E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995).
[CrossRef]

U. Kaiser, N. Kaiser, P. Weissbrodt, U. Mademann, E. Hacker, H. Mueller, “Structure of thin fluoride films deposited on amorphous substrates,” Thin Solid Films 217, 7–16 (1992).
[CrossRef]

U. Kaiser, N. Kaiser, P. Weiβbrodt, D. Mademann, E. Hacker, “Initial layer growth in thin MgF2-, LaF2-, CaF2-, and LiF-films,” Le vide le Coches Mines Suppl. 259, 104–106 (1991).

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

N. Kaiser, “Resistance of coated optics to UV laser irradiation,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE2253, 722 (1994).

Kaiser, U.

U. Kaiser, M. Adamik, G. Sáfrén, P. B. Barnd, S. Laux, W. Richter, “Growth structure investigations of MgF2 and NdF3 MBD films on CaF2 (111) substrates,” Thin Solid Films 280, 5–15 (1996).
[CrossRef]

U. Kaiser, N. Kaiser, P. Weissbrodt, U. Mademann, E. Hacker, H. Mueller, “Structure of thin fluoride films deposited on amorphous substrates,” Thin Solid Films 217, 7–16 (1992).
[CrossRef]

U. Kaiser, N. Kaiser, P. Weiβbrodt, D. Mademann, E. Hacker, “Initial layer growth in thin MgF2-, LaF2-, CaF2-, and LiF-films,” Le vide le Coches Mines Suppl. 259, 104–106 (1991).

Kolbe, J.

J. Kolbe, H. Mueller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” Natl. Stand. Technol. Spec. Publ. 801, p. 404 (1990).

Krajnovich, D. J.

Kulkarni, M.

Laux, S.

U. Kaiser, M. Adamik, G. Sáfrén, P. B. Barnd, S. Laux, W. Richter, “Growth structure investigations of MgF2 and NdF3 MBD films on CaF2 (111) substrates,” Thin Solid Films 280, 5–15 (1996).
[CrossRef]

S. Laux, W. Richter, “Packing density calculation of thin fluoride films from infrared transmission spectra,” Appl. Opt. 35, 97–101 (1996).
[CrossRef] [PubMed]

Leung, W.

Lewis, K. L.

K. L. Lewis, I. T. Muirhead, A. M. Pitt, A. G. Gullis, N. G. Chew, A. Miller, T. J. Wyatt-Davies, “Molecular beam deposition of optical coatings and their characterization,” App. Opt. 28, 2785–2791 (1989).
[CrossRef]

K. L. Lewis, J. A. Savage, “A fundamental approach towards improved optical coatings,” Natl. Bur. Stand. (U.S.) Spec. Publ. 688, 277–286 (1985).

Lichtenstein, T. L.

Lowdermilk, W. H.

Mademann, D.

U. Kaiser, N. Kaiser, P. Weiβbrodt, D. Mademann, E. Hacker, “Initial layer growth in thin MgF2-, LaF2-, CaF2-, and LiF-films,” Le vide le Coches Mines Suppl. 259, 104–106 (1991).

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Mademann, U.

U. Kaiser, N. Kaiser, P. Weissbrodt, U. Mademann, E. Hacker, H. Mueller, “Structure of thin fluoride films deposited on amorphous substrates,” Thin Solid Films 217, 7–16 (1992).
[CrossRef]

Mann, K.

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, K. Mann, E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995).
[CrossRef]

K. Mann, H. Gerhardt, “Automated damage testing facility for excimer laser optics,” Natl. Inst. Stand. Technol. Spec. Publ. 801, p. 39 (1990).

K. Mann, H. Gerhardt, “Set-up of a damage testing facility for excimer laser radiation,” in Excimer Lasers and Applications, D. Basting, ed., Proc. SPIE1023, 136 (1989).

K. Mann, E. Eva, A. Hopfmueller, “Damage testing and characterization of dielectric coatings for high power excimer lasers,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE2253, 731 (1994).

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Mathew, G. J. H.

I. T. Muirhead, C. C. Hale, S. P. Fisher, G. J. H. Mathew, “Interference filters from molecular beam deposition,” in Optical Thin Films and Applications, R. Herrmann, ed., Proc. SPIE1270, 184 (1990).

Matsumoto, Y.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. E. Bennett, L. L. Chase, A. H. Guenther, B. Newnam, M. Soileau, eds., Proc. SPIE1441, 339 (1990).

Milam, D.

Miller, A.

K. L. Lewis, I. T. Muirhead, A. M. Pitt, A. G. Gullis, N. G. Chew, A. Miller, T. J. Wyatt-Davies, “Molecular beam deposition of optical coatings and their characterization,” App. Opt. 28, 2785–2791 (1989).
[CrossRef]

Mueller, H.

U. Kaiser, N. Kaiser, P. Weissbrodt, U. Mademann, E. Hacker, H. Mueller, “Structure of thin fluoride films deposited on amorphous substrates,” Thin Solid Films 217, 7–16 (1992).
[CrossRef]

J. Kolbe, H. Mueller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” Natl. Stand. Technol. Spec. Publ. 801, p. 404 (1990).

Muirhead, I. T.

K. L. Lewis, I. T. Muirhead, A. M. Pitt, A. G. Gullis, N. G. Chew, A. Miller, T. J. Wyatt-Davies, “Molecular beam deposition of optical coatings and their characterization,” App. Opt. 28, 2785–2791 (1989).
[CrossRef]

I. T. Muirhead, C. C. Hale, S. P. Fisher, G. J. H. Mathew, “Interference filters from molecular beam deposition,” in Optical Thin Films and Applications, R. Herrmann, ed., Proc. SPIE1270, 184 (1990).

Pitt, A. M.

K. L. Lewis, I. T. Muirhead, A. M. Pitt, A. G. Gullis, N. G. Chew, A. Miller, T. J. Wyatt-Davies, “Molecular beam deposition of optical coatings and their characterization,” App. Opt. 28, 2785–2791 (1989).
[CrossRef]

Rainer, F.

Raupach, L.

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Richter, W.

S. Laux, W. Richter, “Packing density calculation of thin fluoride films from infrared transmission spectra,” Appl. Opt. 35, 97–101 (1996).
[CrossRef] [PubMed]

U. Kaiser, M. Adamik, G. Sáfrén, P. B. Barnd, S. Laux, W. Richter, “Growth structure investigations of MgF2 and NdF3 MBD films on CaF2 (111) substrates,” Thin Solid Films 280, 5–15 (1996).
[CrossRef]

Ristau, D.

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Sáfrén, G.

U. Kaiser, M. Adamik, G. Sáfrén, P. B. Barnd, S. Laux, W. Richter, “Growth structure investigations of MgF2 and NdF3 MBD films on CaF2 (111) substrates,” Thin Solid Films 280, 5–15 (1996).
[CrossRef]

Savage, J. A.

K. L. Lewis, J. A. Savage, “A fundamental approach towards improved optical coatings,” Natl. Bur. Stand. (U.S.) Spec. Publ. 688, 277–286 (1985).

Schallenberg, U. B.

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, K. Mann, E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995).
[CrossRef]

Schink, H.

J. Kolbe, H. Mueller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” Natl. Stand. Technol. Spec. Publ. 801, p. 404 (1990).

Spool, A.

Tam, A. C.

Thomas, I. M.

Uchimura, R.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. E. Bennett, L. L. Chase, A. H. Guenther, B. Newnam, M. Soileau, eds., Proc. SPIE1441, 339 (1990).

Uhlig, H.

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, K. Mann, E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995).
[CrossRef]

Uwadano, Y.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. E. Bennett, L. L. Chase, A. H. Guenther, B. Newnam, M. Soileau, eds., Proc. SPIE1441, 339 (1990).

Weissbrodt, P.

U. Kaiser, N. Kaiser, P. Weissbrodt, U. Mademann, E. Hacker, H. Mueller, “Structure of thin fluoride films deposited on amorphous substrates,” Thin Solid Films 217, 7–16 (1992).
[CrossRef]

Weißbrodt, P.

U. Kaiser, N. Kaiser, P. Weiβbrodt, D. Mademann, E. Hacker, “Initial layer growth in thin MgF2-, LaF2-, CaF2-, and LiF-films,” Le vide le Coches Mines Suppl. 259, 104–106 (1991).

Weissbrodt, P.

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

Welling, H.

J. Kolbe, H. Mueller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” Natl. Stand. Technol. Spec. Publ. 801, p. 404 (1990).

Wyatt-Davies, T. J.

K. L. Lewis, I. T. Muirhead, A. M. Pitt, A. G. Gullis, N. G. Chew, A. Miller, T. J. Wyatt-Davies, “Molecular beam deposition of optical coatings and their characterization,” App. Opt. 28, 2785–2791 (1989).
[CrossRef]

Yakuoh, T.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. E. Bennett, L. L. Chase, A. H. Guenther, B. Newnam, M. Soileau, eds., Proc. SPIE1441, 339 (1990).

Yamamura, N.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. E. Bennett, L. L. Chase, A. H. Guenther, B. Newnam, M. Soileau, eds., Proc. SPIE1441, 339 (1990).

Yano, M.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. E. Bennett, L. L. Chase, A. H. Guenther, B. Newnam, M. Soileau, eds., Proc. SPIE1441, 339 (1990).

York, B.

App. Opt. (1)

K. L. Lewis, I. T. Muirhead, A. M. Pitt, A. G. Gullis, N. G. Chew, A. Miller, T. J. Wyatt-Davies, “Molecular beam deposition of optical coatings and their characterization,” App. Opt. 28, 2785–2791 (1989).
[CrossRef]

Appl. Opt. (4)

Le vide le Coches Mines Suppl. (1)

U. Kaiser, N. Kaiser, P. Weiβbrodt, D. Mademann, E. Hacker, “Initial layer growth in thin MgF2-, LaF2-, CaF2-, and LiF-films,” Le vide le Coches Mines Suppl. 259, 104–106 (1991).

Natl. Bur. Stand. (U.S.) Spec. Publ. 688 (1)

K. L. Lewis, J. A. Savage, “A fundamental approach towards improved optical coatings,” Natl. Bur. Stand. (U.S.) Spec. Publ. 688, 277–286 (1985).

Natl. Inst. Stand. Technol. Spec. Publ. 801 (1)

K. Mann, H. Gerhardt, “Automated damage testing facility for excimer laser optics,” Natl. Inst. Stand. Technol. Spec. Publ. 801, p. 39 (1990).

Natl. Stand. Technol. Spec. Publ. 801 (1)

J. Kolbe, H. Mueller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” Natl. Stand. Technol. Spec. Publ. 801, p. 404 (1990).

Thin Solid Films (3)

U. Kaiser, M. Adamik, G. Sáfrén, P. B. Barnd, S. Laux, W. Richter, “Growth structure investigations of MgF2 and NdF3 MBD films on CaF2 (111) substrates,” Thin Solid Films 280, 5–15 (1996).
[CrossRef]

U. Kaiser, N. Kaiser, P. Weissbrodt, U. Mademann, E. Hacker, H. Mueller, “Structure of thin fluoride films deposited on amorphous substrates,” Thin Solid Films 217, 7–16 (1992).
[CrossRef]

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, K. Mann, E. Eva, “High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1995).
[CrossRef]

Other (6)

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. E. Bennett, L. L. Chase, A. H. Guenther, B. Newnam, M. Soileau, eds., Proc. SPIE1441, 339 (1990).

N. Kaiser, “Resistance of coated optics to UV laser irradiation,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE2253, 722 (1994).

K. Mann, E. Eva, A. Hopfmueller, “Damage testing and characterization of dielectric coatings for high power excimer lasers,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE2253, 731 (1994).

N. Kaiser, B. Anton, H. Jaenchen, K. Mann, E. Eva, C. Fischer, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, E. Hacker, “Laser conditioning of LaF3/MgF2 dielectric coatings for excimer lasers,” in Laser-Induced Damage in Optical Materials: 1994, H. E. Bennett, A. H. Guenther, M. K. Kozlowski, B. E. Newnam, M. J. Soileau, eds., Proc. SPIE2428, 8 (1994).

I. T. Muirhead, C. C. Hale, S. P. Fisher, G. J. H. Mathew, “Interference filters from molecular beam deposition,” in Optical Thin Films and Applications, R. Herrmann, ed., Proc. SPIE1270, 184 (1990).

K. Mann, H. Gerhardt, “Set-up of a damage testing facility for excimer laser radiation,” in Excimer Lasers and Applications, D. Basting, ed., Proc. SPIE1023, 136 (1989).

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Figures (3)

Fig. 1
Fig. 1

Design of AR coatings for a wavelength of 248 nm on MgF2 substrates: a) C1, two layers with quarter-wavelength thickness; b) C2, 14 layers each with 13 × 12 nm and 1 × 14 nm thickness.

Fig. 2
Fig. 2

Transmission of AR coatings with the two-layer C1 design and the 14-layer C2 design deposited at 300 °C on MgF2 substrates.

Fig. 3
Fig. 3

LIDT of AR coatings on MgF2 substrates with the two-layer C1 design and the stratified 14-layer C2 design for one-on-one measurements at 248 nm.

Tables (1)

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Table 1 Calculated Reflection R and Transmission T

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