Abstract
Kinoforms manufactured in photoresist by photolithographic techniques using a single, ten-level, grey scale photomask, exposed in a specially designed laser exposure system, are described. Kinoforms designed for uniform as well as for partial Gaussian beam illumination are discussed. The highest measured diffraction efficiency was 55%. Photoresist kinoforms were transferred into quartz substrates by reactive ion etching. The highest measured diffraction efficiency for the resulting all-quartz kinoforms was 53%.
© 1990 Optical Society of America
Full Article | PDF ArticleMore Like This
Mats Ekberg, Michael Larsson, Aldo Bolle, and Sverker Hård
Appl. Opt. 30(25) 3604-3606 (1991)
Michael Larsson, Mats Ekberg, Fredrik Nikolajeff, and Sverker Hård
Appl. Opt. 33(7) 1176-1179 (1994)
Jörgen Bengtsson, Niklas Eriksson, and Anders Larsson
Appl. Opt. 35(5) 801-806 (1996)