Abstract

We have performed in situ oxide contamination and XUV reflectance vs angle of incidence studies on fresh aluminum and silicon films evaporated in an ultrahigh vacuum system (base pressure 2 × 10⁻¹⁰ Torr). Our ellipsometric measurements indicate that a surface monolayer of oxide forms on aluminum (1 h at 2 × 10⁻⁸-Torr oxygen) and silicon (1 h at 10⁻⁷-Torr oxygen). The monolayer formation time is inversely proportional to oxygen pressure. Our reflectance vs angle of incidence measurements at 58.4-nm wavelength indicate that unoxidized aluminum and silicon coatings can be used as multifacet retroreflectors with net retroreflectances in excess of 75% for aluminum and 50% for silicon.

© 1988 Optical Society of America

On the Vacuum-Ultraviolet Reflectance of Evaporated Aluminum before and during Oxidation*

R. P. Madden, L. R. Canfield, and G. Hass
J. Opt. Soc. Am. 53(5) 620-625 (1963)

Increasing the Far-Ultraviolet Reflectance of Silicon-Oxide-Protected Aluminum Mirrors by Ultraviolet Irradiation*

Alan P. Bradford and Georg Hass
J. Opt. Soc. Am. 53(9) 1096-1100 (1963)

Calculated Reflectance of Aluminum-Overcoated Iridium in the Vacuum Ultraviolet from 500 Å to 2000 Å

G. Hass and W. R. Hunter
Appl. Opt. 6(12) 2097-2100 (1967)

Optical constants of aluminum films in the extreme ultraviolet interval of 82–77 nm

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez
Appl. Opt. 35(28) 5692-5697 (1996)

Far-ultraviolet reflectance measurements and optical constants of unoxidized aluminum films

J. I. Larruquert, J. A. Méndez, and J. A. Aznárez
Appl. Opt. 34(22) 4892-4899 (1995)