Abstract

The problem of determining the roughness of the A model is used based on the SiO₂/Si interface is treated. Fresnel formalism and scalar scattering theory. The resulting formulas express the diffuse reflectance as a function of the optical constants of the two materials, the oxide thickness and the rms roughness of the interfaces. Using the roughness values as adjustable parameters, quantitative information about the interface roughness is obtained from the diffuse reflectance spectra for an SiO₂/Si double layer. Excellent agreement between calculated and experimental spectra is obtained for an rms roughness of 9.0 nm at the front surface and 2.2 nm at the oxide substrate interface for the case of a low-pressure low-temperature CVD film of SiO₂ on Si.

© 1988 Optical Society of America

Determination of the SiO₂/Si interface roughness by diffuse reflectance measurements

A. Roos, M. Bergkvist, and C. G. Ribbing
Appl. Opt. 27(20) 4314-4317 (1988)

Optical scattering from oxidized metals. 2: Model verification for oxidized copper

Mikael Bergkvist, Arne Roos, Carl G. Ribbing, Jean M. Bennett, and Lars Mattsson
Appl. Opt. 28(18) 3902-3907 (1989)

Determination of interface roughness by using a spectroscopic total-integrated-scatter instrument

Daniel Rönnow, Mikael Bergkvist, Arne Roos, and C.-G. Ribbing
Appl. Opt. 32(19) 3448-3451 (1993)

Optical scattering from oxidized metals. 1: Model formulation and properties

Arne Roos, Mikael Bergkvist, and Carl-Gustaf Ribbing
Appl. Opt. 28(7) 1360-1364 (1989)

Diffuse reflectance and transmittance spectra of an interference layer. 2. Evaluation of tin oxide-coated glass

Daniel Rönnow and Arne Roos
Appl. Opt. 33(34) 7918-7927 (1994)