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  1. G. J. Sonek, D. K. Wagner, J. M. Ballantyne, J. Vac. Sci. Technol. 19, 921 (1981).
    [CrossRef]
  2. D. C. Flanders, A. E. White, J. Vac. Sci. Technol. 19, 892 (1981).
    [CrossRef]
  3. S. Matsui, K. Moriwaki, T. Yamato, H. Aritome, S. Namba, S. Suga, S. Shin (unpublished).
  4. H. W. Lehman, R. Widmer, Appl. Phys. Lett. 32, 163 (1978).
    [CrossRef]
  5. S. Ramo, J. R. Whinnery, T. Van Duzer, Fields and Waves in Communication Electronics (Wiley, New York, 1965), p. 390; see also, E. C. Jordan, K. G. Balmain, Electromagnetic Waves and Radiating Systems (Prentice-Hall, Englewood Cliffs, N.J., 1968), p. 196.

1981

G. J. Sonek, D. K. Wagner, J. M. Ballantyne, J. Vac. Sci. Technol. 19, 921 (1981).
[CrossRef]

D. C. Flanders, A. E. White, J. Vac. Sci. Technol. 19, 892 (1981).
[CrossRef]

1978

H. W. Lehman, R. Widmer, Appl. Phys. Lett. 32, 163 (1978).
[CrossRef]

Aritome, H.

S. Matsui, K. Moriwaki, T. Yamato, H. Aritome, S. Namba, S. Suga, S. Shin (unpublished).

Ballantyne, J. M.

G. J. Sonek, D. K. Wagner, J. M. Ballantyne, J. Vac. Sci. Technol. 19, 921 (1981).
[CrossRef]

Flanders, D. C.

D. C. Flanders, A. E. White, J. Vac. Sci. Technol. 19, 892 (1981).
[CrossRef]

Lehman, H. W.

H. W. Lehman, R. Widmer, Appl. Phys. Lett. 32, 163 (1978).
[CrossRef]

Matsui, S.

S. Matsui, K. Moriwaki, T. Yamato, H. Aritome, S. Namba, S. Suga, S. Shin (unpublished).

Moriwaki, K.

S. Matsui, K. Moriwaki, T. Yamato, H. Aritome, S. Namba, S. Suga, S. Shin (unpublished).

Namba, S.

S. Matsui, K. Moriwaki, T. Yamato, H. Aritome, S. Namba, S. Suga, S. Shin (unpublished).

Ramo, S.

S. Ramo, J. R. Whinnery, T. Van Duzer, Fields and Waves in Communication Electronics (Wiley, New York, 1965), p. 390; see also, E. C. Jordan, K. G. Balmain, Electromagnetic Waves and Radiating Systems (Prentice-Hall, Englewood Cliffs, N.J., 1968), p. 196.

Shin, S.

S. Matsui, K. Moriwaki, T. Yamato, H. Aritome, S. Namba, S. Suga, S. Shin (unpublished).

Sonek, G. J.

G. J. Sonek, D. K. Wagner, J. M. Ballantyne, J. Vac. Sci. Technol. 19, 921 (1981).
[CrossRef]

Suga, S.

S. Matsui, K. Moriwaki, T. Yamato, H. Aritome, S. Namba, S. Suga, S. Shin (unpublished).

Van Duzer, T.

S. Ramo, J. R. Whinnery, T. Van Duzer, Fields and Waves in Communication Electronics (Wiley, New York, 1965), p. 390; see also, E. C. Jordan, K. G. Balmain, Electromagnetic Waves and Radiating Systems (Prentice-Hall, Englewood Cliffs, N.J., 1968), p. 196.

Wagner, D. K.

G. J. Sonek, D. K. Wagner, J. M. Ballantyne, J. Vac. Sci. Technol. 19, 921 (1981).
[CrossRef]

Whinnery, J. R.

S. Ramo, J. R. Whinnery, T. Van Duzer, Fields and Waves in Communication Electronics (Wiley, New York, 1965), p. 390; see also, E. C. Jordan, K. G. Balmain, Electromagnetic Waves and Radiating Systems (Prentice-Hall, Englewood Cliffs, N.J., 1968), p. 196.

White, A. E.

D. C. Flanders, A. E. White, J. Vac. Sci. Technol. 19, 892 (1981).
[CrossRef]

Widmer, R.

H. W. Lehman, R. Widmer, Appl. Phys. Lett. 32, 163 (1978).
[CrossRef]

Yamato, T.

S. Matsui, K. Moriwaki, T. Yamato, H. Aritome, S. Namba, S. Suga, S. Shin (unpublished).

Appl. Phys. Lett.

H. W. Lehman, R. Widmer, Appl. Phys. Lett. 32, 163 (1978).
[CrossRef]

J. Vac. Sci. Technol.

G. J. Sonek, D. K. Wagner, J. M. Ballantyne, J. Vac. Sci. Technol. 19, 921 (1981).
[CrossRef]

D. C. Flanders, A. E. White, J. Vac. Sci. Technol. 19, 892 (1981).
[CrossRef]

Other

S. Matsui, K. Moriwaki, T. Yamato, H. Aritome, S. Namba, S. Suga, S. Shin (unpublished).

S. Ramo, J. R. Whinnery, T. Van Duzer, Fields and Waves in Communication Electronics (Wiley, New York, 1965), p. 390; see also, E. C. Jordan, K. G. Balmain, Electromagnetic Waves and Radiating Systems (Prentice-Hall, Englewood Cliffs, N.J., 1968), p. 196.

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Figures (2)

Fig. 1
Fig. 1

Scanning electron micrograph of a 2300-Å period quartz grating after having been shadowed with 250 Å of Al by the double-shadowing technique. The waveguide structures have an effective period of 1150 Å. Processing parameters are: (1) Ar sputter etch, 30 mTorr, 0.16 W/cm2; (2) CF4 RIE, 15 mTorr, 0.24 W/cm2.

Fig. 2
Fig. 2

Extinction ratio vs wavelength for the grating of Fig. 1 after Ar ion-milling. Milling parameters are: accelerating voltage = 500 V; beam current density = 1 mA/cm2.

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