Abstract

The development of an efficient and durable medium band antireflective coating on germanium for the 8–11.5-μm wavelength region is described. The minimal average reflectance of a double-layer stack is calculated as a function of a varying index of one of the layers, while the second chosen index is kept constant. In this way a comprehensive display of the outcome of various material combinations can be obtained. A homogeneous CdTe/CeF3 double layer is compared to improved coatings, in which the outer layer’s index is synthesized by single-source evaporation of mixtures of CeF3 + SrF2 and CeF3 + SrF2 + CaF2. The addition of a Y2O3 binding layer and the inhomogeneous mixing of the two layer materials at the phase interface by coevaporation significantly improved the durability of the coating.

© 1983 Optical Society of America

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References

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  1. G. Hass, A. F. Turner, “Ergebnisse der Hochvacum technik und der Physik dünner Schichten,” Wissenschaftliche Verlagsgesellschaft, Stuttgart (1957).
  2. J. T. Cox, G. J. Hass, J. Opt. Soc. Am. 48, 677 (1958).
    [CrossRef]
  3. P. H. Berning, J. Opt. Soc. Am. 52, 431 (1962).
    [CrossRef]
  4. C. L. Nagendra, G. K. M. Thutupalli, Vacuum 31, 137 (1981).
    [CrossRef]
  5. E. L. Church, S. R. Nagel, S. E. Schnatterly, T. N. Tudron, Appl. Opt. 13, 1274 (1974).
    [CrossRef]
  6. J. A. Dobrowolski, F. Ho, Appl. Opt. 21, 288 (1982).
    [CrossRef] [PubMed]
  7. K. Schuster, Ann. Phys. (Paris) 4, 352 (1949).
  8. J. T. Cox, G. Hass, Phys. Thin Films 2, 239 (1964).
  9. A. M. Ledger, Appl. Opt. 18, 2979 (1979).
    [CrossRef] [PubMed]
  10. R. Jacobson, Phys. Thin Films 8, 51 (1975).
  11. N. K. Chopra, S. K. Manchanda, R. Hradaynath, Thin Solid Films 55, 49 (1978).
    [CrossRef]
  12. A. E. Ennos, Appl. Opt. 5, 51 (1966).
    [CrossRef] [PubMed]
  13. H. K. Pulker, Proc. Soc. Photo-Opt. Instrum. Eng. 325, 84 (1982).
  14. A. J. Glass, A. H. Guenther, Appl. Opt. 18, 2112 (1979).
    [CrossRef] [PubMed]

1982 (2)

H. K. Pulker, Proc. Soc. Photo-Opt. Instrum. Eng. 325, 84 (1982).

J. A. Dobrowolski, F. Ho, Appl. Opt. 21, 288 (1982).
[CrossRef] [PubMed]

1981 (1)

C. L. Nagendra, G. K. M. Thutupalli, Vacuum 31, 137 (1981).
[CrossRef]

1979 (2)

1978 (1)

N. K. Chopra, S. K. Manchanda, R. Hradaynath, Thin Solid Films 55, 49 (1978).
[CrossRef]

1975 (1)

R. Jacobson, Phys. Thin Films 8, 51 (1975).

1974 (1)

1966 (1)

1964 (1)

J. T. Cox, G. Hass, Phys. Thin Films 2, 239 (1964).

1962 (1)

1958 (1)

1957 (1)

G. Hass, A. F. Turner, “Ergebnisse der Hochvacum technik und der Physik dünner Schichten,” Wissenschaftliche Verlagsgesellschaft, Stuttgart (1957).

1949 (1)

K. Schuster, Ann. Phys. (Paris) 4, 352 (1949).

Berning, P. H.

Chopra, N. K.

N. K. Chopra, S. K. Manchanda, R. Hradaynath, Thin Solid Films 55, 49 (1978).
[CrossRef]

Church, E. L.

Cox, J. T.

J. T. Cox, G. Hass, Phys. Thin Films 2, 239 (1964).

J. T. Cox, G. J. Hass, J. Opt. Soc. Am. 48, 677 (1958).
[CrossRef]

Dobrowolski, J. A.

Ennos, A. E.

Glass, A. J.

Guenther, A. H.

Hass, G.

J. T. Cox, G. Hass, Phys. Thin Films 2, 239 (1964).

G. Hass, A. F. Turner, “Ergebnisse der Hochvacum technik und der Physik dünner Schichten,” Wissenschaftliche Verlagsgesellschaft, Stuttgart (1957).

Hass, G. J.

Ho, F.

Hradaynath, R.

N. K. Chopra, S. K. Manchanda, R. Hradaynath, Thin Solid Films 55, 49 (1978).
[CrossRef]

Jacobson, R.

R. Jacobson, Phys. Thin Films 8, 51 (1975).

Ledger, A. M.

Manchanda, S. K.

N. K. Chopra, S. K. Manchanda, R. Hradaynath, Thin Solid Films 55, 49 (1978).
[CrossRef]

Nagel, S. R.

Nagendra, C. L.

C. L. Nagendra, G. K. M. Thutupalli, Vacuum 31, 137 (1981).
[CrossRef]

Pulker, H. K.

H. K. Pulker, Proc. Soc. Photo-Opt. Instrum. Eng. 325, 84 (1982).

Schnatterly, S. E.

Schuster, K.

K. Schuster, Ann. Phys. (Paris) 4, 352 (1949).

Thutupalli, G. K. M.

C. L. Nagendra, G. K. M. Thutupalli, Vacuum 31, 137 (1981).
[CrossRef]

Tudron, T. N.

Turner, A. F.

G. Hass, A. F. Turner, “Ergebnisse der Hochvacum technik und der Physik dünner Schichten,” Wissenschaftliche Verlagsgesellschaft, Stuttgart (1957).

Ann. Phys. (Paris) (1)

K. Schuster, Ann. Phys. (Paris) 4, 352 (1949).

Appl. Opt. (5)

J. Opt. Soc. Am. (2)

Phys. Thin Films (2)

J. T. Cox, G. Hass, Phys. Thin Films 2, 239 (1964).

R. Jacobson, Phys. Thin Films 8, 51 (1975).

Proc. Soc. Photo-Opt. Instrum. Eng. (1)

H. K. Pulker, Proc. Soc. Photo-Opt. Instrum. Eng. 325, 84 (1982).

Thin Solid Films (1)

N. K. Chopra, S. K. Manchanda, R. Hradaynath, Thin Solid Films 55, 49 (1978).
[CrossRef]

Vacuum (1)

C. L. Nagendra, G. K. M. Thutupalli, Vacuum 31, 137 (1981).
[CrossRef]

Wissenschaftliche Verlagsgesellschaft, Stuttgart (1)

G. Hass, A. F. Turner, “Ergebnisse der Hochvacum technik und der Physik dünner Schichten,” Wissenschaftliche Verlagsgesellschaft, Stuttgart (1957).

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Figures (5)

Fig. 1
Fig. 1

Lowest theoretical average reflectance vs refractive index of the outer layer in a double-layer stack on Ge with n2 = 2.65.

Fig. 2
Fig. 2

Calculated (a) and measured (b) reflectance of Ge plate coated with CdTe/CeF3.

Fig. 3
Fig. 3

Refractive index of the mixture CeF3 + SrF2 as a function of weight ratio of the components in the source.

Fig. 4
Fig. 4

Calculated (a) and measured (b) reflectance of Ge plate coated with CdTe/CeF3 + SrF2.

Fig. 5
Fig. 5

Calculated (a) and measured (b) reflectance of Ge coated with CdTe/CeF3 + SrF2 + CaF2.

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