Abstract

The calculation of extreme ultraviolet (EUV) mask diffraction spectrum is the key of EUV lithography simulation. In this paper, a fast rigorous EUV mask model is proposed to calculate the diffraction spectrum fast and accurately. Based on the mask structure decomposition method, the relationship among the region diffraction, the boundary diffraction of the absorber, and the direction of incident light is analyzed at first. Then the frequency-domain functions related to angle of incidence and diffraction angle are established to model the geometrical and boundary diffraction of the absorber. The fast rigorous EUV mask model is established by combining the equivalent layer multilayer model based on the Fresnel formula and the accurate absorber model. Simulations and comparisons show the effectiveness of the proposed model. For the 14 nm vertical line-space pattern, the calculation errors of critical dimension (CD) via the proposed model are reduced by 80.6% and 93.9% compared with the structure decomposition method for dense and isolate features.

© 2020 Optical Society of America

Full Article  |  PDF Article
More Like This
Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewall

Zinan Zhang, Sikun Li, Xiangzhao Wang, and Wei Cheng
Appl. Opt. 60(20) 5776-5782 (2021)

Fast extreme ultraviolet lithography mask near-field calculation method based on machine learning

Jiaxin Lin, Lisong Dong, Taian Fan, Xu Ma, Rui Chen, and Yayi Wei
Appl. Opt. 59(9) 2829-2838 (2020)

Source mask optimization for extreme-ultraviolet lithography based on thick mask model and social learning particle swarm optimization algorithm

Zinan Zhang, Sikun Li, Xiangzhao Wang, Wei Cheng, and Yuejing Qi
Opt. Express 29(4) 5448-5465 (2021)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (18)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (5)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (10)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription