Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
About All Issues

RAPID Lithography: New Photoresists Achieve Nanoscale Resolution

John T. Fourkas

Not Accessible

Your library or personal account may give you access

Abstract

Over the past decade, researchers have shattered the traditional view of the diffraction limit. Using new techniques, they have obtained resolution far smaller than the wavelength of light excitation or emission. Similar concepts are now being applied to photolithography, making it possible to create nanoscale features in a photoresist using visible or near-infrared light.

© 2011 Optical Society of America

PDF Article

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use