Abstract
Methods for preparing laminar phase diffraction gratings of up to 400 lines per in. are described. The grating is copied photomechanically from a master amplitude grating and the phase-reversing layer applied by vacuum evaporation. Silica is used for transmission and chromium for reflection gratings, the resultant optical elements being extremely robust and of a high degree of uniformity.
© 1960 Optical Society of America
Full Article | PDF ArticleMore Like This
John Strong
J. Opt. Soc. Am. 50(12) 1148-1152 (1960)
P. H. Berning, G. Hass, and R. P. Madden
J. Opt. Soc. Am. 50(6) 586-597 (1960)
George R. Harrison and George W. Stroke
J. Opt. Soc. Am. 50(12) 1153-1158 (1960)