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Preparation of Phase Diffraction Gratings by Vacuum Evaporation

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Abstract

Methods for preparing laminar phase diffraction gratings of up to 400 lines per in. are described. The grating is copied photomechanically from a master amplitude grating and the phase-reversing layer applied by vacuum evaporation. Silica is used for transmission and chromium for reflection gratings, the resultant optical elements being extremely robust and of a high degree of uniformity.

© 1960 Optical Society of America

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