Abstract
The direct patterning of hybrid-polymer microring resonators with minimal residual layers by
UV-assisted nanoimprint lithography is reported. The proposed stamp-and-repeat technology requires no post-processing.
The imprint polymer was applied by spin-coating as a 130–150 nm thin initial film for an optimized
processing. The importance of the initial film thickness is discussed in detail. Aspect ratios of more than 5:1 were
realized with 2 µm high ridge-waveguides and sub-400 nm coupling gaps on maximal 130 nm thin
residual layers. The achieved ratio of structure height to residual layer thickness of 15.4 (2 µm versus
130 nm) was much larger than the typical values in high-resolution imprinting and superseded the removal of the
residual layer completely. The resonators are thought as biosensor transducers. High quality devices with Q-factors up
to 13 000 were produced with a minimal set of process steps.
© 2014 IEEE
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