Abstract

Simultaneous phase velocity and characteristic impedance matching of the ultrahigh-speed electrooptic modulators is presented by using the finite-element method (FEM). It is also shown that the dielectric loss in the silica buffer layer is larger than that in the lithium niobate substrate and when these dielectric losses are included, the resulting bandwidth is reduced significantly. It is also shown that for an etched LN structure, it is relatively easier to match both Nm and Zc simultaneously and the resulting optical bandwidth is also greater.

[IEEE ]

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