Abstract

Different laminated structures of TiO₂/SiO₂ composite film were prepared via atomic layer deposition (ALD) on alumina substrates. The effect of the annealing temperature in the air on the surface morphologies, crystal structures, binding energies, and ingredient content of these films was investigated using X-ray diffraction, field emission scanning electron microscopy, and X-ray photoelectron spectroscopy. Results showed that the binding energy of Ti and Si increased with decrease of the Ti content, and the TiO₂/SiO₂ nanolaminated films exhibited a complex bonding structure. As the annealing temperature increased, the thickness of the nanolaminated films decreased, and the density and surface roughness increased. An increase in the crystallization temperature was proportional to the SiO₂ content in TiO₂/SiO₂ composite film. The annealing temperature and thin thickness strongly affected the phase structure of the ALD TiO₂ thin film. To be specific, the TiO₂ thin film transformed into an anatase phase from an amorphous phase after an increase in the annealing temperature from 400°C to 550°C, and the TiO₂ film exhibited an anatase phase until the annealing temperature reached 850°C, owing to its extremely small thickness. The annealing process caused the Al ions in the substrate to diffuse into the films and bond with O.

© 2021 Chinese Laser Press

Morphology, structure and optical properties in TiO₂ nanostructured films annealed at various temperatures

Bin Wang, Hongji Qi, Hu Wang, Yanyan Cui, Jiaoling Zhao, Jialu Guo, Yun Cui, Youchen Liu, Kui Yi, and Jianda Shao
Opt. Mater. Express 5(6) 1410-1418 (2015)

Characteristics of ion-beam-sputtered high-refractive-index TiO₂-SiO₂ mixed films

Shiuh Chao, Wen-Hsiang Wang, Min-Yu Hsu, and Liang-Chu Wang
J. Opt. Soc. Am. A 16(6) 1477-1483 (1999)

Effects of annealing on the optical, structural, and chemical properties of TiO₂ and MgF₂ thin films prepared by plasma ion-assisted deposition

Seouk-Hoon Woo and Chang Kwon Hwangbo
Appl. Opt. 45(7) 1447-1455 (2006)

Effects of temperature on columnar microstructure and recrystallization of TiO2 film produced by ion-assisted deposition

Hsi-Chao Chen, Cheng-Chung Lee, Cheng-Chung Jaing, Ming-Hua Shiao, Chih-Jung Lu, and Fuh-Sheng Shieu
Appl. Opt. 45(9) 1979-1984 (2006)

Effect of thermal annealing on the optical properties and residual stress of TiO₂ films produced by ion-assisted deposition

Cheng-Chung Lee, Hsi-Chao Chen, and Cheng-Chung Jaing
Appl. Opt. 44(15) 2996-3000 (2005)