Optical, structural, and mechanical properties of silicon oxynitride films prepared by pulsed magnetron sputtering

Chien-Jen Tang; Cheng-Chung Jaing; Chuen-Lin Tien; Wei-Chiang Sun; Shih-Chin Lin

doi:10.1364/AO.56.00C168

Applied Optics
Vol. 56,
Issue 4,
pp. C168-C174
(2017)
•https://doi.org/10.1364/AO.56.00C168

Optical, structural, and mechanical properties of silicon oxynitride films prepared by pulsed magnetron sputtering

Chien-Jen Tang, Cheng-Chung Jaing, Chuen-Lin Tien, Wei-Chiang Sun, and Shih-Chin Lin

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Chien-Jen Tang, Cheng-Chung Jaing, Chuen-Lin Tien, Wei-Chiang Sun, and Shih-Chin Lin, "Optical, structural, and mechanical properties of silicon oxynitride films prepared by pulsed magnetron sputtering," Appl. Opt. 56, C168-C174 (2017)

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Abstract

Silicon oxynitride films were deposited by reactive pulsed magnetron sputtering. The optical, structural, and mechanical properties of silicon oxynitride films with different nitrogen proportions were analyzed via spectroscopy, atomic force microscopy, Twyman–Green interferometer, and nanoindentation. The refractive indices of the silicon oxynitride films were adjusted from 1.487 to 1.956 with the increase in nitrogen proportions. The surface roughness decreased from 1.33 to 0.97 nm with the increase in nitrogen proportions. The residual stress of the silicon oxynitride films was higher than for pure silicon nitride and silicon dioxide films. The hardness and Young’s modulus increased from 13.51 to 19.74 GPa and 110.41 to 140.49 GPa with the increase in nitrogen proportions, respectively. The hardness and Young’s modulus of antireflection coatings using silicon oxynitride film were 13.64 GPa and 102.11 GPa, respectively. Silicon oxynitride film could be used to improve the hardness of antireflective coatings.

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Films	Hardness (GPa)	Ref.
${TiO}_{2}$	Anatase, 8; Rutile, 17	[16]
${HfO}_{2}$ ,	15.5–16	[15]
${ZrO}_{2}$	11.5–12.2	[15]
${Nb}_{2} O_{5}$	6.1	[13]
${Ta}_{2} O_{5}$	8.1	[13]
${Si}_{3} N_{4}$	23.4	[16]
${Al}_{2} O_{3}$	11.2–12.3	[15]
${SiO}_{2}$	9.5–10.7	[15]

	Stoichiometry by XPS Si2p, N1s, O1s		Stoichiometry by XPS Si 2p( ${Si}_{3} N_{4}$ ) Si 2p( ${SiO}_{2}$ )		Stoichiometry by Bruggeman Model
$N_{2}$ Proportion (%)	$x$	$y$	$x$	$y$	$x$	$y$
100.0	0.03	1.33	0.00	1.33	0.00	1.33
96.0	0.26	1.17	0.24	1.17	0.27	1.16
92.3	0.63	0.92	0.61	0.93	0.62	0.92
85.7	0.89	0.75	0.88	0.74	0.91	0.73
80.0	1.25	0.51	1.28	0.48	1.26	0.50
75.0	1.89	0.08	1.84	0.11	1.87	0.09
${SiO}_{2}$ (0.00%)	2.00	0.00	2.00	0.00	2.00	0.00

Films	Hardness (GPa)	Ref.
${TiO}_{2}$	Anatase, 8; Rutile, 17	[16]
${HfO}_{2}$ ,	15.5–16	[15]
${ZrO}_{2}$	11.5–12.2	[15]
${Nb}_{2} O_{5}$	6.1	[13]
${Ta}_{2} O_{5}$	8.1	[13]
${Si}_{3} N_{4}$	23.4	[16]
${Al}_{2} O_{3}$	11.2–12.3	[15]
${SiO}_{2}$	9.5–10.7	[15]

	Stoichiometry by XPS Si2p, N1s, O1s		Stoichiometry by XPS Si 2p( ${Si}_{3} N_{4}$ ) Si 2p( ${SiO}_{2}$ )		Stoichiometry by Bruggeman Model
$N_{2}$ Proportion (%)	$x$	$y$	$x$	$y$	$x$	$y$
100.0	0.03	1.33	0.00	1.33	0.00	1.33
96.0	0.26	1.17	0.24	1.17	0.27	1.16
92.3	0.63	0.92	0.61	0.93	0.62	0.92
85.7	0.89	0.75	0.88	0.74	0.91	0.73
80.0	1.25	0.51	1.28	0.48	1.26	0.50
75.0	1.89	0.08	1.84	0.11	1.87	0.09
${SiO}_{2}$ (0.00%)	2.00	0.00	2.00	0.00	2.00	0.00

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Applied Optics