Abstract

In this work, we propose the generation of diffraction-resistant beams by using a parabolic reflector and a source of spherical waves positioned at a point slightly displaced from its focus (away from the reflector). In our analysis, considering the reflector dimensions much greater than the wavelength, we describe the main characteristics of the resulting beams, showing their properties of resistance to the diffraction effects. Due to its simplicity, this method may be an interesting alternative for the generation of long-range diffraction-resistant waves.

© 2015 Optical Society of America

Diffraction–attenuation resistant beams: their higher-order versions and finite-aperture generations

Michel Zamboni-Rached, Leonardo A. Ambrósio, and Hugo E. Hernández-Figueroa
Appl. Opt. 49(30) 5861-5869 (2010)

Beam diffraction by a resistive half-plane

Yusuf Ziya Umul
Appl. Opt. 54(10) 2665-2671 (2015)

Integral equation analysis of an arbitrary-profile and varying-resistivity cylindrical reflector illuminated by an E-polarized complex-source-point beam

Taner Oğuzer, Ayhan Altintas, and Alexander I. Nosich
J. Opt. Soc. Am. A 26(7) 1525-1532 (2009)

Optimal position of an emitter in a wavelength-scale parabolic reflector

Harry Penketh, Jacopo Bertolotti, and William L. Barnes
Appl. Opt. 58(29) 7957-7961 (2019)

Simple and effective method for the analytic description of important optical beams when truncated by finite apertures

Michel Zamboni-Rached, Erasmo Recami, and Massimo Balma
Appl. Opt. 51(16) 3370-3379 (2012)