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Coating uniformity improvement for a dense-wavelength-division-multiplexing filter by use of the etching effect

Jin-Cherng Hsu, Cheng-Chung Lee, Chien-Chung Kuo, Sheng-Hui Chen, Jean-Yee Wu, Huang-Lu Chen, and Ching-Yi Wei

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Abstract

The uniformity of optical narrow-bandpass filters for dense wavelength division multiplexing (DWDM) has been improved by control of the coating parameters of electron guns and the ion source. The optical film was deposited by the electron gun and was etched by the ion source during the ion-assisted deposition process. The uniformity of the coating of a 100 GHz DWDM filter is better than ±0.003% over a circular area of 50 mm in diameter when such an etching process is used.

© 2005 Optical Society of America

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