Abstract

We prepared eight samples of Mo/X and W/X (X = BN:O, B₄C:O, Si, and C) multilayers by magnetron sputtering. Analyses of x-ray photoelectron spectroscopy for the boron nitride and the B₄C layers showed the concentration of O to be nonnegligible. We have evaluated the thermal stability by measuring soft-x-ray specular reflectances before and after thermal annealing occurs at temperatures as high as 700 °C. The results suggest that the thermal stability depends largely on the inclusion of low-density materials and not on the type of metal. Of the four low-density materials studied, BN:O is thermally the most stable, and the Mo/BN:O multilayer, the most stable among the eight samples, shows stability as high as 700 °C.

© 1994 Optical Society of America

Thermal stability of soft x-ray Mo–Si and MoSi₂-Si multilayer mirrors

V. V. Kondratenko, Yu. P. Pershin, O. V. Poltseva, A. I. Fedorenko, E. N. Zubarev, S. A. Yulin, I. V. Kozhevnikov, S. I. Sagitov, V. A. Chirkov, V. E. Levashov, and A. V. Vinogradov
Appl. Opt. 32(10) 1811-1816 (1993)

Thermal and stress studies of normal incidence Mo/B₄C multilayers for a 6.7 nm wavelength

Miriam Barthelmess and Saša Bajt
Appl. Opt. 50(11) 1610-1619 (2011)

Stability and normal incidence reflectivity of W/B₄C multilayer mirror near the boron K absorption edge

P. N. Rao, S. K. Rai, M. Nayak, and G. S. Lodha
Appl. Opt. 52(25) 6126-6130 (2013)

Thermal stability of Mg/Co multilayer with B₄C, Mo or Zr diffusion barrier layers

Jingtao Zhu, Sika Zhou, Haochuan Li, Zhanshan Wang, Philippe Jonnard, Karine Le Guen, Min-Hui Hu, Jean-Michel André, Hongjun Zhou, and Tonglin Huo
Opt. Express 19(22) 21849-21854 (2011)

In situ performance tests of soft-x-ray multilayer mirrors exposed to synchrotron radiation from a bending magnet

Mihiro Yanagihara, Takumi Maehara, Sunartoto Gunadi, Motoyuki Asano, and Takeshi Namioka
Appl. Opt. 31(7) 972-976 (1992)