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Sub-micron silicon nitride waveguide fabrication using conventional optical lithography

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Abstract

We demonstrate fabrication of sub-μm SiN waveguides using contact lithography with MEMS-grade photomasks for nonlinear optics and sensing applications that can provide 0.8dB/cm propagation loss, γ=0.3W−1/m nonlinearity, and <100ps/nm.km dispersion.

© 2014 Optical Society of America

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