Fabrication of Deterministic Quantum Light Sources using Cathodoluminescence Lithography

Manuel Gschrey; Fabian Gericke; Ronny Schmidt; Elisa Schlottmann; Anja Schüssler; Jan-Hindrick Schulze; Tobias Heindel; Sven Rodt; André Strittmatter; Stephan Reitzenstein

doi:10.1364/QIM.2014.QW4A.5

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Quantum Information and Measurement 2014

Messe Berlin, Berlin Germany
18–20 March 2014
ISBN: 978-1-55752-995-4

From the session
Photonics III & QKD II (QW4A)

Fabrication of Deterministic Quantum Light Sources using Cathodoluminescence Lithography

Manuel Gschrey, Fabian Gericke, Ronny Schmidt, Elisa Schlottmann, Anja Schüssler, Jan-Hindrick Schulze, Tobias Heindel, Sven Rodt, André Strittmatter, and Stephan Reitzenstein

Research in Optical Sciences
OSA Technical Digest (online) (Optical Society of America, 2014),
paper QW4A.5
•https://doi.org/10.1364/QIM.2014.QW4A.5

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M. Gschrey, F. Gericke, R. Schmidt, E. Schlottmann, A. Schüssler, J. Schulze, T. Heindel, S. Rodt, A. Strittmatter, and S. Reitzenstein, "Fabrication of Deterministic Quantum Light Sources using Cathodoluminescence Lithography," in Research in Optical Sciences , OSA Technical Digest (online) (Optical Society of America, 2014), paper QW4A.5.

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Related Topics
Optics & Photonics Topics
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The topics in this list come from the OSA Optics and Photonics Topics applied to this article.
Previously assigned OCIS codes
- Lithography (220.3740)
- Quantum-well, -wire and -dot devices (230.5590)
- Cathodoluminescence (250.1500)

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Abstract

We report on the deterministic integration of single quantum dots in sub-μm sized mesa-structures. The fabrication process is based on a pre-selection of quantum dots by cathodoluminescence spectroscopy and their integration via in-situ electron-beam lithography.

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Abstract

Quantum Information and Measurement 2014

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