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Conferences > QELS > 2000 > QThN > QThN1
  • Quantum Electronics and Laser Science Conference
  • OSA Technical Digest (Optica Publishing Group, 2000),
  • paper QThN1

Quantum interferometric lithography: exploiting entanglement to beat the diffraction limit

Agedi N. Boto, Daniel S. Abrams, Colin P. Williams, and Jonathan P. Dowling

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Abstract

It has been known for some time that entangled photon pairs, such as generated by spontaneous parametric down conversion,1 have unusual imaging characteristics with sub-shot-noise interferometric phase measurement.2,3

© 2000 Optical Society of America

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