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Conferences > QELS > 2000 > QMF > QMF4
  • Quantum Electronics and Laser Science Conference
  • OSA Technical Digest (Optica Publishing Group, 2000),
  • paper QMF4

In-situ fabrication of nanostructures by photo-enhanced chemical vapor deposition using optical near field

G.H. Lee, Y. Yamamoto, M. Kourogi, and M. Ohtsu

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Abstract

Photo-enhanced chemical vapor deposition (PE-CVD) offers the possibility for the lateral integration (i.e., side by side) of different structures (different sequence of layers, materials, thickness and dopants), without the need of any lithography or etching, in a single growth run.

© 2000 Optical Society of America

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