Practical Anti-Microbial Surfaces on Nylon and Polyester by UV Photochemistry

Michael J. Kelley; Zhengmao Zhu

doi:10.1364/PHAST.2007.PTuE5

Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper PTuE5
•https://doi.org/10.1364/PHAST.2007.PTuE5

Practical Anti-Microbial Surfaces on Nylon and Polyester by UV Photochemistry

Michael J. Kelley and Zhengmao Zhu

Photonic Applications Systems Technologies Conference 2007

Baltimore, Maryland United States
ISBN: 1557528349

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Ambient and Environmental Issues (PTuE)

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M. J. Kelley and Z. Zhu, "Practical Anti-Microbial Surfaces on Nylon and Polyester by UV Photochemistry," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper PTuE5.

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Abstract

Surface radicals generated by 193 nm (nylon) or 172 nm (PET) UV light afford strongly antimicrobial amine functionality by grafting or by transformation. They are broadly effective in the lab and significantly viable in the field.

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