Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > PhAST > 2006 > PTuB > PTuB2
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • Technical Digest (CD) (Optica Publishing Group, 2006),
  • paper PTuB2
  • •https://doi.org/10.1364/PHAST.2006.PTuB2

Methods and Tools for Semiconductor Annealing and Silicon Thin Film Crystallization using Solid State Lasers

Peter Oesterlin, Berthold Burghardt, Hans-Juergen Kahlert, and L. Michael Heglin

Not Accessible

Your library or personal account may give you access

Abstract

For future 65 nm and smaller nodes, thermal anneal processes in the ms and µs range are required. Based on laboratory tests using the line scan method, an R&D system has been developed

© 2006 Optical Society of America

PDF Article
More Like This
Laser annealing of doped semiconductors for ultra-shallow junctions: Systems for thermal processes in the ms range

Peter Oesterlin, Berthold Burghardt, Hans-Juergen Kahlert, Guenter Hollemann, and Wolfgang Hemmer-Girod
PWE2 Photonic Applications Systems Technologies Conference (CLEO:A&T) 2005

Laser annealing and crystallization of silicon

G. K. Celler
THC1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1981

Silicon Carbide Cooled Solid-State Laser

G. Alex Newburgh and Mark Dubinskii
CFB6 Conference on Lasers and Electro-Optics (CLEO:S&I) 2006

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use