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Conferences > PV > 2016 > PTh3A > PTh3A.3

Promising Plasma Textured Black Silicon at Etch Temperatures > 0 °C for PV Applications

Maria Gaudig, Jens Hirsch, Johannes Ziegler, Dominik Lausch, Alexander N. Sprafke, Norbert Bernhard, and Ralf B. Wehrspohn

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Abstract

Maskless plasma texturing, as an outstanding method to fabricate highly antireflective silicon surfaces, is optimized at etch temperatures above 0 °C. We achieve excellent optoelectronic properties suitable for silicon solar cell applications.

© 2016 Optical Society of America

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