The thin films of Ni and Cu have been deposited on SiO2/Si(100) substrates in a thermal evaporator. The graphene layers have been grown on Ni-Cu films under C2H2-H2-Ar plasma under vacuum annealing condition in ICP-CVD.

© 2019 The Author(s)

PDF Article
More Like This
Direct Growth of Large-area Graphene by Cross-linked Parylene Graphitization toward Photodetection

Yibo Dong, Chuantong Cheng, Chen Xu, Xurui Mao, Yiyang Xie, Guanzhong Pan, Qiuhua Wang, and Jie Sun
STh3O.3 CLEO: Science and Innovations (CLEO_SI) 2019

Chemical Vapor Deposition (CVD) of Graphene for Four-Wave-Mixing (FWM) Based QPSK Wavelength Conversion

Xiao Hu, Andong Wan, Mengqi Zeng, Long Zhu, Yun Long, Chengcheng Gui, Jing Du, Xuhui Li, Lei Fu, and Jian Wang
JTu5A.28 CLEO: Applications and Technology (CLEO_AT) 2015

SiOx, SiNx, SiNxOy Deposited By ICP-CVD System With Optimized Uniformity For Optical Coatings

Xiaonan Tan, Jacek Wojcik, Haiqiang Zhang, and Peter Mascher
MB4 Optical Interference Coatings (OIC) 2007


You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
Login to access OSA Member Subscription