Abstract

Optical Interference Coatingss deposited by thermal Atomic Layer Deposition (ALD) in large batches is presented. The use of ALD enables the ability to coat all surfaces of optical components conformally and with atomic layer precision. © 2019 The Author(s)

© 2019 The Author(s)

PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription