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Conferences > OIC > 2016 > WA > WA.10

Modelling and validation of a large area thin film uniform deposition on a rotating drum Using Microwave Reactive Sputtering

Cheng Li, Shigeng Song, Ewan Waddell, David Child, and Des Gibson

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Abstract

A model has been developed and validated for predicting film uniformity based on sputtering yield, angular distribution, mask shielding and film growth process in a multipass microwave/magnetron sputtering system using Niobium deposition on glass.

© 2016 Optical Society of America

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