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Magnetron Sputtering of Precision Optical Coatings Enabled by Process Stability of Rotatable Cathodes

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Abstract

Cylindrical rotatable cathodes deliver huge material amounts under stable conditions as needed for interference coatings. Sub-stoichiometric targets and plasma oxidation produce low absorbance and virtually no drift of refractive index associated with changeless material uniformity.

© 2016 Optical Society of America

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